The invention discloses full-automatic silicon wafer cleaning and spin-drying equipment, and relates to the field of silicon wafer production. Comprising a cleaning box, a plurality of cleaning bins are formed in the cleaning box, a water spraying mechanism is installed in each cleaning bin, a sliding rail is connected to the upper portion of the cleaning box, a moving mechanism is arranged below the sliding rail, and a hanging basket is connected to the bottom end of the moving mechanism in a hanging mode. According to the silicon wafer cleaning device, through the arrangement of the hanging basket, the motor and the mounting column, after silicon wafers in the hanging basket are cleaned, the hanging basket is moved to the position near the mounting column through the moving mechanism, the hanging basket is clamped to the mounting column through the fixing rod, the motor is started, and the motor drives the hanging basket to rotate through the mounting column; when the hanging basket rotates, water in the hanging basket is discharged through the water discharging inclined opening under the action of centrifugal force, when the hanging basket rotates, the hanging basket drives outside air to enter the air groove formed in the hanging basket through the first air inlet and the second air inlet formed in the two sides, and airflow is discharged through the intercepting net to air the outer side of the silicon wafer.