The invention relates to the technical field of vacuum measurement, in particular to a double-layer absolute pressure type MEMS
capacitor film vacuum gauge, which comprises a
silicon substrate, a glass substrate and a PCB, and is characterized in that the
silicon substrate comprises a thick
silicon layer, a
silicon oxide layer and a thin silicon layer from bottom to top; obtaining a
reference cavity and a film extraction
electrode window on the thick silicon layer, and obtaining a
pressure sensing film and a film extraction
electrode on the thin silicon layer; the glass substrate comprises a
silicon electrode and glass; a
silicon electrode lead-out hole is formed in the center of the glass; the lower surface of the
silicon electrode is bonded with the upper surface of the glass through
anodic bonding; an insulating layer is arranged on the upper surface of the silicon
electrode; performing secondary
anodic bonding on the upper surface of the glass and the lower surface of the thick silicon layer; and the combination body of the silicon substrate and the glass substrate is welded with the PCB through a bonding pad and
soldering tin. The double-layer structure of the silicon substrate and the glass substrate is adopted, the preparation process flow is simplified, the sensitivity is high, the stability is good, and the absolute vacuum degree in the range of 1 * 10 <-2 > Pa to 1 * 10 < 5 > Pa can be measured.