Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

498 results about "Monitoring tool" patented technology

Assay device, system and method

A system for treating a blood sample (700) having an analyte of interest comprises a strip (200) having a membrane (218), respective portions (216, 220 and 222, or 300) which are provided for receiving the sample, for lysing cells of the sample to liberate hemoglobin, and for capturing glycated hemoglobin. The latter two portions (220 and 222, or 300) of the membrane are treated with lysing and capture agents, respectively. A portion of the strip (214 or 230 or 240) is provided for holding an eluting agent and for releasing the agent upon a release condition. A system for detecting analyte comprises an optical subsystem (550) that is aligned with the strip to provide a signal corresponding to an amount of analyte, and an electronic subsystem (650) for processing the signal (560) to provide a result, such as an amount or percentage of glycated hemoglobin. To use these systems, the user simply applies a small sample (700) to the membrane (218) and closes a door (10) of the detection system over the strip (200) such that the door triggers the release of the eluting agent. No sample pre-treatment is required. The preferably handheld system (100) is a simple and convenient monitoring tool for the user, such as a diabetic patient who must monitor blood glucose on an on-going basis. While the systems are useful in the monitoring of blood glucose, they may be used for treating a sample other than blood and detecting an analyte other than an analyte in blood.
Owner:ABBOTT DIABETES CARE INC

Test structure for monitoring overetching of silicide during contact opening

For the contact opening in advanced IC processing, it becomes critical to monitor the degree of overetching of the thin silicide layer and also to obtain the etching rate of the silicide layer. A method is disclosed which will allow the electrical measurements of the sheet resistance of the exposed (by the contact etch) silicide layer, thus allowing electrical measurements to the integrity as well as the thickness of the remaining silicide layer. A main feature of the disclosed test method is a modification of the conventional van der Pauw test structure, or of the cross-bridge structure (which will allow electrical measurement of the line width, in addition to the sheet resistance information). Contrary to the conventional van der Pauw structure or cross-bridge structure where the contact opening pattern is designed to expose only the specific areas needed for allowing electrical connection to the four measurement pads, the contact opening mask is designed to expose some or all of the van der Pauw or cross-bridge structure, thus allowing the electrical measurement of the degree of silicide overetching during contact opening. The disclosed test method and corresponding structure can be applied as an on-wafer process monitor tool following the complete normal process flow, thus serving as a convenient on-wafer monitor.
Owner:NAT SCI COUNCIL
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products