The invention relates to the technical field of coatings, in particular to a PVD (
Physical Vapor Deposition)
coating process method applied to a galvanized sheet
stamping die, which comprises the following steps of: pretreating the die, cleaning the surface of the die by a wet process, placing the die in a
vacuum deposition cavity, vacuumizing, and heating to a preset temperature in an
inert gas environment;
plasma pretreatment is conducted on the surface of the mold, a high-power pulse magnetron
sputtering cathode of a
chromium target is selected to
discharge in the
argon working environment to generate
plasma rich in
chromium ions, and
negative bias voltage is applied to the mold; starting at least one unbalanced magnetron
sputtering cathode, gradually increasing the target current by the unbalanced magnetron
sputtering cathode in a
current ramp-up mode so as to improve the target
voltage, and synchronously introducing
nitrogen as a reaction gas, so that a
nitride transition layer is deposited on the surface of the mold; and a high-power pulse magnetron sputtering cathode and an unbalanced magnetron sputtering cathode synchronously work on the
transition layer to carry out multi-source reactive sputtering deposition, so that a multi-layer hard
coating formed by alternating
titanium aluminum
vanadium and
chromium nitride is formed. By combining the high-power pulse magnetron sputtering technology and the unbalanced magnetron sputtering technology, the problems that in the prior art, a
coating is poor in
adhesive force and insufficient in high
temperature resistance are solved.