11 results about "Hydrazine derivatives" patented technology

A method of forming high quality a-BN layers. The method includes use of a precursor chemistry that is particularly suited for use in a cyclical deposition process such as in chemical vapor deposition (CVD), atomic layer deposition (ALD), and the like. In brief, new methods are described of forming boron nitride (BN) layers from precursors capable of growing amorphous BN (a-BN) films by CVD, ALD, or the like. In some cases, the precursor is or includes a borane adduct of hydrazine or a hydrazine derivative.

The invention discloses a preparation method and application of a coumarin-hydrazide-based semi-sandwich type iridium and ruthenium complex, the structural formula of the complex is as shown in formula (I), the complex takes a coumarin-hydrazide derivative as an NO bidentate ligand, and an oxygen coordination atom in the ligand is derived from hydroxyl of a coumarin mother nucleus; iridium or ruthenium is used as a metal center, benzene is used as a unique solvent, alkali does not need to be added additionally under the protection of nitrogen, and the ligand can be prepared through a coordination reaction of the ligand and a metal dimer. The complex shows good anti-cancer activity, the drug effect of the complex is close to that of cis-platinum, and the complex has the potential value of becoming a novel anti-cancer drug.

The present invention provides a cyano-substituted cyclic hydrazine derivative, comprising: a compound represented by the following structural formula or a stereoisomer, a geometric isomer, a tautomer, a racemate, a hydrate, a solvate, a metabolite and a pharmaceutically acceptable salt or a prodrug thereof The compound is used for prevention, treatment or alleviation of autoimmune diseases or proliferative diseases in patients, and / or for inhibiting or modulating protein kinase activity.

The invention belongs to the technical field of organic synthesis, and particularly relates to a benzenesulfonyl hydrazide derivative, a preparation method and application. Under electrochemical reaction conditions, cheap and easily available ketone, benzenesulfonyl hydrazide and corresponding sodium benzenesulfinate are used as raw materials, acetonitrile (CH3CN) / water (H2O) is used as a solvent, triethylamine (Et3N) is used as alkali, the benzenesulfonyl hydrazide derivative is prepared at room temperature and in an air atmosphere, and the benzenesulfonyl hydrazide derivative has potential medicinal value and is widely applied to the fields of pesticides and medicines. Compared with a previously reported preparation method, the method has the advantages of being green, environmentally friendly, safe, efficient and energy-saving, raw materials are easy to obtain, operation is easy and convenient, and potential industrial application prospects are achieved.

The present application provides a treatment liquid which is excellent in removal of organic residues and excellent in stability. A treatment method of a treated object related to the above treatment liquid is also provided. The treatment liquid contains water, hydroxylamine, and hydrazine species selected from one or more of hydrazine, hydrazine salts, and hydrazine derivatives, and the total content of the hydrazine species is 1 parts by mass or less relative to 100 parts by mass of the hydroxylamine.

The application belongs to the field of medicine, and discloses a compound with the structure of formula I, a preparation method of the compound, and the compound is a pyrazole acylhydrazine derivative containing a diphenyl ether unit, which is obtained by substituting p-chloronitrobenzene with phenol, and then by reduction, diazotization, re-reduction, hydrochloric acid removal and hydrazide reaction; the pyrazole acylhydrazine derivative containing the diphenyl ether unit has obvious inhibitory effect on human pancreatic cancer cells, human breast cancer cells and human gastric cancer cells, and can be used as a potential new type of antitumor candidate drug molecule.

This invention provides a treatment liquid with excellent removal and stability of organic residues. It also provides a method for treating a substance related to the above treatment liquid. The treatment liquid contains water, hydroxylamine, and one or more hydrazines selected from hydrazine, hydrazine salts, and hydrazine derivatives, wherein the total content of the hydrazines is less than 1 part by mass relative to 100 parts by mass of hydroxylamine.

The invention describes a process for producing soluble salts of 5,5-azotetrazole (5,5-AT) by oxidation of 5-aminotetrazole with a soluble peroxodisulfate in a strongly alkaline environment. This compound is a precursor of the energetic component of non-toxic priming mixtures, 5,5- bis-hydrazino-tetrazole (BTH). BTH can be prepared by reduction of salts or solutions of 5,5-AT with ascorbic acid. 5,5-AT

Provided is a fiber bundling agent that comprises an aqueous urethane resin composition containing a urethane resin and an aqueous medium, and that is characterized in that: the urethane resin is obtained by using, as essential raw materials, a polyol compound, a diisocyanate compound, a nonionic group-containing compound, and a hydrazine derivative having an active hydrogen atom; the polyol compound includes a polyester polyol; the diisocyanate compound includes an aliphatic diisocyanate compound and / or an alicyclic diisocyanate compound; the nonionic group-containing compound includes polyoxyethylene monomethyl ether and / or polyethylene glycol; and the percentage content of the nonionic group-containing compound is in the range of 3-10 mass% of the raw materials of the urethane resin. The fiber bundling agent exhibits excellent storage stability and bundling properties, generates less pyrolysis gases during molding, and can contribute to yellowing resistance of a formed product.

The invention provides a low-cost and high-plating-speed pure palladium chemical plating solution for a power chip, which comprises the following components based on the total amount of the plating solution: 0.4-0.6 g / L of water-soluble palladium salt, 20-30 g / L of composite complexing agent, 10-20 g / L of pH buffer agent, 8-12 g / L of double reducing agent, 0.1-0.5 g / L of accelerator and 5-8 mg / L of stabilizer, the composite complexing agent comprises 5-10 g / L of organic amines and 15-20 g / L of amino carboxylic acid; the double reducing agents are selected from two of hydrazine substances, formic acid substances or hydroxylamine substances. The chemical palladium plating solution disclosed by the invention can be used for high-speed pure palladium plating in an aluminum substrate chemical nickel-palladium-gold plating surface treatment process on a power chip, an obtained plating layer is a phosphorus-free pure palladium plating layer, the plating speed of the plating solution under the condition of lower palladium content reaches 0.049 mu m / min, the liquid medicine cost and the time cost in the production process can be effectively reduced, and the production efficiency is improved. And meanwhile, the plating solution further has good stability, and stable operation of five MTOs can be achieved.

The invention provides a chemical mechanical polishing solution for polishing a silicon substrate and capable of improving recycling performance as well as a preparation method and application of the chemical mechanical polishing solution. The chemical mechanical polishing solution at least comprises the following raw material components: an abrasive material, a composite pH regulator, a reducing agent, a dispersing agent, a metal complexing agent and water, the reducing agent comprises one or two of hydrazine derivatives and oxime compounds. The chemical mechanical polishing solution provided by the technical method has the advantages that the removal rate is high, the attenuation degree of the removal rate is small after the chemical mechanical polishing solution is recycled for multiple times, and the color of the chemical mechanical polishing solution is not yellowed after the chemical mechanical polishing solution is recycled for a long time.