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30results about How to "Shortened TAT" patented technology

Mask pattern inspecting method, inspection apparatus, inspecting data used therein and inspecting data generating method

A method of inspecting a photomask for a semiconductor integrated circuit formed based on drawing pattern data, includes the steps of classifying a drawing pattern of the semiconductor integrated circuit into a plurality of ranks in accordance with a predetermined reference and extracting the same, determining inspecting accuracy for each of the ranks, and deciding quality of the photomask depending on whether the determined inspecting accuracy is satisfied.
Owner:SOCIONEXT INC

Transfer system and transfer method of object to be processed

InactiveUS20060152211A1Enhance transfer efficiencyCommunication efficiency be improveElectronic circuit testingDigital data processing detailsTransfer systemCommunication interface
A transfer method employs a transfer system including a semiconductor handling device and an automatic transfer device. The semiconductor handling device includes a first transfer mechanism and a first optically coupled parallel I / O communications interface. The automatic transfer device includes a second transfer mechanism and a second optically coupled parallel I / O communications interface. The transfer method includes a successive transfer notifying step wherein the automatic transfer device and the semiconductor handling device notify each other that a successive transfer is possible via an optical communications between the first and the second optically coupled parallel I / O communications interface in case where a plurality of objects to be processed are able to be successively transferred one by one between the first and the second transfer mechanism; and a successive transfer step wherein the objects are transferred one by one between the first and the second transfer mechanism.
Owner:TOKYO ELECTRON LTD

Method of designing semiconductor device

This is a method of designing a semiconductor device. The method includes: arranging cells used for an electric circuit and wirings respectively connected to gates of the cells in a coordinate region to create chip layout data including the cells, gates and wirings; checking whether each gate included in the chip layout data is in antenna violation; storing antenna violation information in an error-remaining portion library, the antenna violation information representing an antenna violation gate group, in which gates in the antenna violation are contained, in the gates included in the chip layout data; performing lithography simulation for the chip layout data to create predicted layout data after photoresist exposure; selecting the antenna violation gate group from the gates included in the predicted layout data, with reference to the error-remaining library; calculating a calculated value representing a ratio of an area of an wiring of the wirings with respect to an area of a gate of the antenna violation gate group connected to the wiring, for each gate of the antenna violation group; and adjusting a size of the gate of the antenna violation gate group, when the calculated value of the antenna violation group included in the predicted layout data is in a range between a first and second setting value.
Owner:RENESAS ELECTRONICS CORP
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