36 results about "Array Feature" patented technology

Methods and apparatus are described to facilitate forming memory devices with low resistance polysilicon local interconnects that allow a smaller array feature size and therefore facilitate forming arrays of a denser array format. Embodiments of the present invention are formed utilizing a wet etch process that has a high selectivity, allowing the deposition and etching of polysilicon local interconnects to source regions of array transistors. By providing for a local interconnect of polysilicon, a smaller source region and / or drain region can also be utilized, further decreasing the required word line spacing. Low resistance polysilicon local source interconnects can also couple to an increased number of memory cells, thereby reducing the number of contacts made to an array ground.

Methods for correcting systematic errors in the measured position of deposited features of a nucleic acid array on a substrate. Systematic errors are modeled by an algorithmic model based on measuring the positions (and possibly other properties) of a subset of the features, and a model is constructed for predicting deviations in feature position from an ideal grid. Deviations arising in the deposition process, the scanning process, or both may be corrected.

An antenna array formed of individual electrically connected pluralities of wideband antenna elements. The array features a centrally located rectangular ground plane having a top surface defined by four edges. Each of said pluralities of elements is engaged to a separate substrate which is engaged along one of the four edges. The substrates may be angled to adjust the footprint of the antenna.

Methods and apparatus are described to facilitate forming memory devices with low resistance polysilicon local interconnects that allow a smaller array feature size and therefore facilitate forming arrays of a denser array format. Embodiments of the present invention are formed utilizing a wet etch process that has a high selectivity, allowing the deposition and etching of polysilicon local interconnects to source regions of array transistors. By providing for a local interconnect of polysilicon, a smaller source region and / or drain region can also be utilized, further decreasing the required word line spacing. Low resistance polysilicon local source interconnects can also couple to an increased number of memory cells, thereby reducing the number of contacts made to an array ground.

A method for forming patterns of a semiconductor device includes preparing an etch target layer defined with a first region and a second region; forming a regular first feature which is positioned over the etch target layer in the first region and a random feature which is positioned over the etch target layer in the second region; forming a regular second feature over the regular first feature; forming first and second cutting barriers which expose a portion of the random feature, over the random feature; cutting the regular first feature using the regular second feature, to form a regular array feature; cutting the random feature using the first cutting barrier and the second cutting barrier, to form a random array feature; and etching the etch target layer by using the regular array feature and the random array feature, to form a regular array pattern and a random array pattern.

The invention provides a digital detection-oriented MBD model array feature rapid labeling method, which relates to the technical field of digital detection. This method first uniformly samples a group of array features on the MBD model to obtain the sampling point cloud; then uses the PCA algorithm and the improved ICP algorithm to perform coarse registration and precise registration between the sampling point clouds, and establishes the relationship between the sampling point clouds. Matching relationship; finally, according to the corresponding relationship between the sampled point clouds, complete the missing labeling information of the array features. The digital detection-oriented MBD model array feature rapid labeling method provided by the present invention automatically completes the missing information on the basis of not interfering with the designer's habit of marking the MBD model's array feature, and improves the efficiency of array feature dimension labeling and accuracy, so that the array feature objects marked by the rapid labeling method meet the requirements of measurability, and realize the one-to-one correspondence between the objects to be inspected and the inspection requirements.

The invention discloses a signal processing two-dimensional data array feature enhancing and data compressing method which comprises a step of parameter calculation, a step of small array calculation, a step of feature point calculation and the like. Via the signal processing two-dimensional data array feature enhancing and data compressing method, two-dimensional data array feature points can be enhanced and a total quantity of data can be compressed; the method is characterized by concise procedures, high speed, high execution efficiency, and synchronous completion of feature enhancing operation and data compressing operation.

The invention discloses a TiO2 nuclear shell structure nano rod array coated with carbon bed, the core of the nano rod is TiO2 nano rod, the diameter thereof is 20-100nm, the shell thereof is the carbon bed, the thickness thereof is 2-10nm. The preparation method has the following steps: a) under the condition of solvent heat condition, interface reaction of non-polar solvent / hydrophilic matrix is employed to prepare the TiO2 nano rod with surface modified by oleic acid; b) with the protection of inert gas, warming calcination is carried out to obtain the TiO2 nuclear shell structure nano rodcoated with carbon bed. The invention has the following beneficial effects: under the condition of solvent heat condition, interface reaction of non-polar solvent / hydrophilic matrix is employed to prepare the TiO2 nano rod with surface modified by oleic acid, then warming calcination is carried out to carbonize oleic acid on the surface to prepare the TiO2 nuclear shell structure nano rod array coated with carbon bed, with such steps, the invention features simple process and low cost, can prepare a large area of TiO2 nano rod array; in addition, the nano rod array features good crystallization performance, large specific surface area, is beneficial to improving charge capacity of the dye, adsorption to pollutants, charge separation of a photoproduction current carrier and increasing quantum yield, thus being capable of being widely applied to fields such as photocatalysis and O / E conversion.

The invention relates to a four-camera plane array feature point matching method and a measurement method based on the four-camera plane array feature point matching method, belonging to the field of optical and electronic measurement. The matching method includes taking one of the four image planes as the base image plane, and finding a feature point that matches the feature point on an image plane adjacent to the base image plane in the lateral direction for a feature point on the base image plane. All matching points; for the feature points on the base image plane, find out all the matching points that match the feature points on the image plane adjacent to the base image plane in the longitudinal direction; all the found horizontal and vertical directions The matching points are re-matched to find out all sub-matching point groups; find out the matching points corresponding to the feature points on the diagonal position image plane and the base image plane and all found sub-matching point groups; determine the matching points in the four image planes A unique matching point group corresponding to the same viewpoint. For each unique matching point group, the three-dimensional space coordinates of the viewpoint can be calculated according to the image coordinates of the matching point group and the parameters of the camera system itself. Under any lighting conditions, as long as the collected images are clear enough, for any object that is imaged on the image of the four-camera planar array and has certain image characteristics, the exact same matching method and measurement method can be used to achieve the object’s detection. 3D measurement.