A microwave plasma processing device comprising a chamber housing therein a material to be processed, a processing gas supplying means for supplying processing gas into the chamber, a microwave generating source for generating microwave forming the processing gas plasma in the chamber, a wave guiding means for guiding microwave generated in the microwave generating source toward the chamber, a flat antenna consisting of a conductor having a plurality of microwave radiating holes for radiating microwave guided by the wave guiding means toward the chamber, a microwave transmitting plate constituting the top wall of the chamber, transmitting microwave passed through the microwave radiating holes of the flat antenna and consisting of a dielectrics, and a delay plate provided on the opposite side of the microwave transmitting plate of the flat antenna, having a function of shortening the wavelength of microwave reaching the flat antenna and consisting of a dielectrics. The flat antenna and the microwave transmitting plate are substantially in close contact with each other with no air therebetween, the delay plate and the microwave transmitting plate are formed of the same material, and the delay plate, the flat antenna, the microwave transmitting plate and an equivalent circuit formed by the processing gas plasma formed in the chamber satisfy a resonance condition.