Patents
Literature
Patsnap Eureka AI that helps you search prior art, draft patents, and assess FTO risks, powered by patent and scientific literature data.

2results about How to "Simple compensation process" patented technology

Brightness compensation method, device and equipment

PendingCN119600923Afast compensationshorten the compensation timeStatic indicating devicesEngineeringLightness
The invention discloses a brightness compensation method, device and equipment. The brightness compensation method comprises the following steps: performing initial brightness compensation on a display module by adopting a compensation algorithm for removing brightness unevenness; performing secondary brightness compensation on the display module by adopting a color uniformity debugging algorithm; and if the uniformity of the display module after the secondary brightness compensation accords with the optical specification, the compensation of the display module is completed. The embodiment of the invention has a better compensation effect on the brightness compensation of the display module.
Owner:HEFEI VISIONOX TECH CO LTD

Methods for compensating for overprinting deviation

A method for compensating overlay misalignment includes: providing a wafer; performing a first pre-compensation and a second pre-compensation on a lithography machine; forming an initial fin structure on the wafer, wherein the sum of the compensation value of the first pre-compensation and the previous first etching misalignment of the initial fin structure is 0; obtaining a first etching misalignment of the initial fin structure, wherein the first etching misalignment is the same as the compensation value of the second pre-compensation; performing a third compensation on the lithography machine based on the first etching misalignment; performing a fourth pre-compensation on the lithography machine; after performing the third and fourth pre-compensations on the lithography machine, partially etching the initial fin structure to form a fin structure, wherein the sum of the compensation value of the fourth pre-compensation and the compensation value of the second pre-compensation is 0, and the compensation value of the second pre-compensation is the same as the previous second etching misalignment of the fin structure; obtaining a second etching misalignment of the fin structure, wherein the value of the second etching misalignment is 0. This method improves overlay accuracy.
Owner:SEMICON MFG INT (SHANGHAI) CORP