The invention discloses a symmetry-controlled double-layer Van der Waals nanobelt device, a design method and application, and belongs to the technical field of
nanoelectronics. The design method comprises the steps that based on a single-layer JGNR, different alignment conditions of atoms between an upper layer and a lower layer are considered, and bl-JGNR van der Waals structures of different stacking
modes are built; the bl-JGNR van der Waals structures in different stacking
modes are used for respectively building a double-layer van der Waals nanobelt device; each kind of double-layer Van der Waals nanobelt device only comprises one kind of bl-JGNR Van der Waals structure. The built double-layer Van der Waals nanobelt device obtains multiplied
spinning current and
charge current while maintaining the original
spinning resolution current property, in addition, through cooperative regulation and control of
uniaxial compression strain,
spinning electrons are driven to move by utilizing
temperature difference, the spinning current can be expanded again, the
charge current can be inhibited to the maximum extent, and the performance of the device is improved. The effect is wide in application temperature range,
waste heat is effectively utilized to complete
thermoelectric conversion, and energy waste is reduced.