The invention provides a bridge type GaN device and a preparation method thereof. The preparation method comprises the steps of providing a semiconductor substrate with a buffer structure and an epitaxial structure, forming a passivation layer on the epitaxial structure, preparing a source electrode and a drain electrode, preparing a gate trench, and forming a bridge type gate structure. Accordingto the invention, the power density of a transistor is increased by stacking a plurality of two-dimensional electron gas channels; through the design of the bridge type gate structure, based on a gate embedded in the epitaxial structure, the drain current is controlled by modulating the width of two-dimensional electron gas through a transverse gate electric field, so that the roll-off of transconductance derived from electron speed modulation is reduced, the peak value of transconductance is reduced, the planarization of transconductance change is realized, and the linearity of a device is improved; based on the design of a suspended bridge type gate structure, a high electric field area on the surface is eliminated, the problems of caused current attenuation and collapse are solved, thelack of a contact top gate also eliminates a vertical electric field at a gate drain end, the inverse piezoelectric effect is greatly inhibited, and the reliability is improved.