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51results about How to "Reduce the chance of total reflection" patented technology

Large-angle lens and large-angle light-emergent LED (Light Emitting Diode) light source module

The invention discloses a large-angle LED (Light Emitting Diode) lens, comprising a main body, wherein the lower end of the main body is provided with an opening, the main body is shell-shaped and is provided with light-incident surfaces and light-emergent surfaces; the light-incident surfaces are symmetrically arranged around the central axis of the main body, and are positioned at the inner sides of the main body; the light-emergent surfaces are arranged at the outer side of the main body; the light-incident surfaces are light-transmitting concave surfaces; the light-emergent surfaces are light-transmitting convex surfaces; the maximum thickness d1 of the lower part of the main body and the minimum thickness d2 of the top part of the main body meet the condition that d1 / d2 is more than 4 and less than 6; the concave depth h1 of each light-transmitting concave surface and the minimum thickness d2 of the top part of the main body meet the relation: h1 is more than 4*d2; and the convex height h2 of the light-transmitting convex surface and the minimum thickness d2 of the top part of the main body meet the relation: h2 is more than 5*d2. The large-angle LED lens disclosed by the invention has the advantages that the light beam angle of the large-angle lens is converted to be larger than 130 degrees so as to realize large-angle illumination and simultaneously improve the illumination uniformity; and due to the design with the light-transmitting concave surfaces and the light-transmitting convex surfaces, the total reflection probability of light is reduced to be lowest, so that the enlarging of the light-emergent angle is ensured, simultaneously, the efficiency of the lens is also enabled to be 90%, and the light utilization rate is furthest increased. The invention also discloses a large-angle light-emergent LED light source module.
Owner:FOSHAN NATIONSTAR OPTOELECTRONICS CO LTD

Display panel and manufacturing method thereof, and display device

The embodiment of the invention provides a display panel and a manufacturing method thereof, and a display device. The display panel comprises a substrate, a light-emitting device layer and a light adjusting structure layer, wherein the light-emitting device layer is located on the substrate, and comprises a plurality of light-emitting devices, the light adjusting structure layer is located on theside, away from the substrate, of the light-emitting device layer, and comprises a plurality of light adjusting units and a dielectric layer covering the plurality of light adjusting units, the refractive index of the light adjusting units is smaller than that of the dielectric layer, each light adjusting unit comprises a light adjusting sub-part, each light adjusting unit comprises a through hole, the through holes penetrate through the light adjusting units in the direction perpendicular to the substrate, the through holes are overlapped with the light emitting device, and the light adjusting sub-parts are arranged around the through holes. For one light adjusting unit, the thickness of the light adjusting part is gradually increased in the direction from the through hole to the light adjusting sub-part. The probability that light rays are totally reflected in the display panel and limited in the display panel can be reduced, and the light emitting efficiency of the light emitting device is improved.
Owner:HUBEI YANGTZE IND INNOVAION CENT OF ADVANCED DISPLAY CO LTD

Electrode structure capable of enhancing luminous efficiency, QLED and preparation method of electrode structure capable of enhancing luminous efficiency

The invention discloses an electrode structure capable of enhancing luminous efficiency, a QLED and a preparation method of the electrode structure capable of enhancing the luminous efficiency. The electrode structure comprises a substrate, a transparent electrode which is arranged on the surface of the substrate and has multiple slots, a doped oxide filling in the slots and a nickel oxide film ora manganese oxide film which is deposited on the surface of the transparent electrode. According to the electrode structure, the doped oxide is introduced to the transparent electrode having the slots to fill in the slots and then a layer of nickel oxide film or manganese oxide film is deposited on the transparent electrode, the light emitted out of the luminous layer can be effectively constrained by introducing of the nickel oxide film or the manganese oxide film, the light can be guided into the slots of the transparent electrode to a greater extent, and the light emergent angle of the light from the transparent electrode to the glass interface can be changed by using the slots and the probability of total reflection can be reduced so that the luminous efficiency of the device can be enhanced. The barrier of the transparent electrode and the luminous functional layer can be reduced and the hole injection efficiency of the device can be enhanced.
Owner:TCL CORPORATION

Self-service photographing device

The invention provides a self-service photographing device. A main light installation chamber is formed in a photographing cabinet body, the main light installation chamber is provided with a window close to a background cabinet body, a main illumination lamp module, an upper light barrier plate and a lower light barrier plate. Light rays emitted by the main illumination lamp module are emitted from the interior of the main light installation chamber via the window, the upper light barrier plate is used for limiting the upper limit of an illumination range of the light rays emitted by the mainillumination lamp module to the upper limit of a visual angle of a camera, and the lower light barrier plate is used for limiting the lower limit of the illumination range of the light rays emitted by the main illumination lamp module to the lower limit of the visual angle of the camera. By adopting the scheme, the average distance between the main illumination lamp module and a person is nearlydoubled, and the illumination area is increased by 50% or above, so that the light rays projected on the person are more uniform, defects such as uneven illumination and shadow are avoided, a good lighting effect in a small space is achieved, photography conditions of professional character photography are achieved, and therefore the photography effect is improved.
Owner:曾奕

A method of manufacturing a light emitting diode

The invention provides a manufacturing method for a light-emitting diode. The method includes the following steps: firstly, depositing a light-emitting epitaxial layer which, includes at least an N-type layer, a quantum well layer and a P-type layer, on the surface of a semiconductor substrate; then etching the P-type layer and the quantum well layer and then forming an N-electrode preparation area; then forming an ITO transparent conductive layer on the surface of the P-type layer and preparing a P-electrode on the surface of the ITO transparent conductive layer and preparing an N-electrode on the N-electrode preparation area; then placing the structure in a mixed liquid of a ZnO powder and an HCI solution and depositing a ZnO thin film on the surface of the structure; and at last, removing the P-electrode, the N-electrode and the ZnO thin film on the surface of the N-electrode preparation area so as to complete the manufacturing of the light-emitting diode. The manufacturing method for the light-emitting diode has the following beneficial effects: the ZnO thin film, which does not damage the light-emitting diode and the surface of which is roughened, on the ITO transparent conductive layer on the surface of a P-GaN surface so that reduction of a total-reflection rate of light in the light-emitting diode is facilitated and thus the brightness of the light-emitting diode is improved.
Owner:EPILIGHT TECH

A method for testing the emission wavelength of Gaas-based semiconductor laser epitaxial wafers and its application

The invention relates to a method for measuring GaAs-based semiconductor laser epitaxial wafer light-emitting wavelength and application thereof. A GaAs-based semiconductor laser epitaxial wafer comprises a substrate, a lower wrapping layer, an active region, an upper wrapping layer and a contact layer from the bottom up in sequence. The method has the following specific steps: 1) growing a layer of dielectric film, non-absorbing the light emitted by the active region, on the surface of the GaAs-based semiconductor laser epitaxial wafer, wherein refractive index m of the dielectric film is larger than 1 and smaller than n, n being refractive index of the light, emitted by the GaAs-based semiconductor laser epitaxial wafer, in the GaAs, and the thickness d of the dielectric film is larger than 0 and equal to or smaller than lambda / 2m, lambda being the wavelength of the light emitted by the GaAs-based semiconductor laser epitaxial wafer, and the surface of the dielectric film is rough; 2) carrying out routine photoluminescence test; and 3) removing the dielectric film. According to the method, the probability of total reflection when the light emitted by the GaAs-based semiconductor laser epitaxial wafer is incident to the air is greatly reduced, and the number of light rays escaping out of the epitaxial wafer is increased.
Owner:Shandong Huaguang Optoelectronics Co. Ltd.

A light emitting diode and its manufacturing method

The invention discloses a light-emitting diode of a novel structure. The light-emitting diode comprises a transparent substrate, an outwards-extending sheet, a first electrode and a second electrode. The outwards-extending sheet sequentially comprises an n type ohm layer, an n type roughening layer, an n type limiting layer, an active layer, a P type limiting layer, a p type roughening layer and a p type ohm layer. The area of the end face of the n type ohm layer is smaller than that of the end face of the n type roughening layer, the area of the end face of the p type ohm layer is smaller than that of the end face of the p type roughening layer, one side, close to the p type ohm layer and the p type roughening layer, of the outwards-extending sheet is adhered to the transparent substrate through a transparent conductive adhesive layer, the first electrode is connected to the n type ohm layer, the second electrode is connected to the transparent conductive adhesive layer, the outer surfaces of the p type roughening layer and the n type roughening layer are etched to be in the convex-concave shape through corrosive liquid, and the outer end face of the p type ohm layer is further plated with an alloy layer. The invention further discloses a manufacturing method of the light-emitting diode, the light-emitting diode of the novel structure and the manufacturing method of the light-emitting diode effectively reduce loss of emitted light generated by full reflection in the light-emitting diode and improve light-emitting efficiency.
Owner:XIAMEN CHANGELIGHT CO LTD
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