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100results about How to "Stable travel" patented technology

Vacuum welding furnace and welding technology

The invention provides a vacuum welding furnace and a welding technology, and belongs to the technical field of vacuum welding. The vacuum welding furnace is characterized in that one end, close to the feeding end, of a welding platform (20) is used as a heating area; one side, close to the discharging end, of the welding platform (20) is used as a cooling area; a negative pressure pumping module(9) is arranged at the upper side of one end, close to the cooling area, of the heating area, and the negative pressure pumping module (9) is mounted on a furnace cover (4) by lifting; the bottom partof the negative pressure pumping module (9) and the heating area encircles a closed negative pressure chamber; a protecting gas inlet pipe is arranged on a welding chamber (18) or the furnace cover (4). According to the vacuum welding furnace, material sheets can be heated through the heating area, so that the material sheets can be quickly welded in the negative pressure chamber; protecting gasis charged, so that the material sheets are prevented from reacting with oxygen during being heated; the material sheets can be cooled and prevented from being oxidized through the cooling area. According to the welding technology, the welding time is decreased; the welding is accelerated; with the adoption of the cooling area, the material sheet can be completely cooled and is prevented from deformation caused by excessively quick cooling.
Owner:SHANDONG CAIJU ELECTRONICS TECH CO LTD

Double-side coating apparatus, method for coating double sides with coating solution, edge rinsing apparatus, and edge rinsing method

Provided is a double-side coating apparatus which can uniformly coat both surfaces of a substrate to be processed with a coating solution and form uniform coating films on both the surfaces of the substrate to be processed. A double-side coating apparatus (1) includes a holding mechanism (3a) which holds a substrate (2) to be processed so that the thickness direction of the substrate (2) to be processed is a horizontal direction; a rotational driving mechanism which rotates the substrate (2) to be processed in a circumferential direction; a first coating solution nozzle (18a) which jets a coating solution onto one main surface (2a) of the substrate (2) to be processed; and a second coating solution nozzle which jets the coating solution onto the other main surface (2b) of the substrate (2) to be processed. The first coating solution nozzle (18a) and the second coating solution nozzle are symmetrically arranged with respect to a thickness center surface of the substrate (2) to be processed. Provided is an edge rinsing apparatus which can accurately and stably rinse only a fixed width of an outer peripheral portion of the substrate and can easily control the width of the outer peripheral portion to be rinsed even if the width of the outer peripheral portion to be rinsed is small.
Owner:SHOWA DENKO KK

Double-sided coating apparatus and method for double-sided coating with coating solution

Provided are a double-sided coating apparatus and a method for double-sided coating with a coating solution configured to uniformly apply a coating solution to both surfaces of a substrate having a central opening in a simple process while preventing ingress of the coating solution to the central opening. A coating apparatus 1 according to the invention applies a coating solution to both main surfaces of a substrate 2 having a central opening 2a. The coating apparatus 1 includes: a rotation driving mechanism 3 with a chuck 11 which holds the substrate 2 by blocking the central opening 2a; a first coating solution nozzle 18 which ejects a coating solution to a first main surface of the substrate 2; a first pivot driving mechanism 17 which operates the first coating solution nozzle 18 to move to scan the first main surface of the substrate 2; a second coating solution nozzle 28 which ejects the coating solution to a second main surface of the substrate 2; a second pivot driving mechanism 31 which operates the second coating solution nozzle 28 to move to scan the second main surface of the substrate 3, and a device to independently control an ejection amount of the coating solution from the first coating solution ejection port 23 and an ejection amount of the coating solution from the second coating solution ejection port 29.
Owner:SHOWA DENKO KK
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