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Supporting device, lithographic apparatus, and device manufacturing method employing a supporting device, and a position control system arranged for use in a supporting device

A supporting device for supporting in a lithographic projection apparatus a supported part relative to a supporting part, is presented. The supporting device includes a first part that engages the supporting part of the lithographic projection apparatus; a second part that engages the supported part of the lithographic projection apparatus; a supporting spring system disposed between the first part and the second part; and a position control system configured to control a position of the supported part. The position control system comprises at least one reference object that is movable relative to the supporting part; a reference support device that supports the reference object relative to the first part, wherein the reference object and the reference support device form a reference mass-spring system; at least one position sensor that detects at least one attribute of the position of the second part relative to at least one of the reference objects, the position sensor including a sensor output for outputting a position signal representing at least one of the attributes; and an actuator, communicatively coupled to the position sensor, that is configured to adjust the position of the second part relative to the first part, in response to the position signal.
Owner:ASML NETHERLANDS BV
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