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38results about How to "Long interval" patented technology

Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned

The invention relates to a method and device for depositing at least one layer, particularly a semiconductor layer, onto at least one substrate (5), which is situated inside a process chamber (2) of a reactor (1) while being supported by a substrate holder (4). The layer is comprised of at least two material components provided in a fixed stoichiometric ratio, which are each introduced into the reactor (1) in the form of a first and a second reaction gas, and a portion of the decomposition products form the layer, whereby the supply of the first reaction gas, which has a low thermal activation energy, determines the growth rate of the layer, and the second reaction gas, which has a high thermal activation energy, is supplied in excess and is preconditioned, in particular, by an independent supply of energy. The first reaction gas flows in a direction (11) toward the substrate holder (4) through a multitude of openings (6), which are distributed over a surface (18) of a gas inlet element (3), said surface being located opposite the substrate holder (4). According to the invention, the second process gas is preconditioned with a plasma before entering the process chamber (1), and it enters the process chamber (2) at the edge (19) of the substrate holder (4) directly thereabove and flows parallel to the substrate holder surface.
Owner:AIXTRON AG

Liquid ejection apparatus and control method for liquid ejection apparatus

InactiveUS20070076025A1Reduce evaporation volumeSuppresses consumptionOther printing apparatusLiquid jetEngineering
The liquid ejection apparatus comprises: a nozzle which ejects liquid; a pressure chamber which is connected to the nozzle; an actuator which generates pressure applied to the liquid inside the pressure chamber, the actuator driving liquid ejection for ejecting the liquid from the nozzle, the actuator driving vibrating action to the liquid for causing a free surface of the liquid in the nozzle to vibrate to an extent that does not eject the liquid from the nozzle; a viscosity state judgment device which judges viscosity states of the liquid in a vicinity of the free surface of the liquid in the nozzle, the viscosity states including a first state in which the liquid ejection from the nozzle is possible and the vibrating action is not required for the nozzle, a second state in which the liquid ejection from the nozzle is possible and the vibrating action is required for the nozzle, and a third state in which the liquid ejection from the nozzle is not possible and restoration to the first state is possible if the vibrating action is performed for the nozzle; and a control device which, in a case where the liquid ejection from the nozzle is to be performed, controls in the first state so as to perform the liquid ejection from the nozzle without performing the vibrating action for the nozzle, and controls in either one of the second state and the third state so as to perform the liquid ejection from the nozzle after performing the vibrating action for the nozzle, and which, in a case where the liquid ejection from the nozzle is not to be performed, controls in either one of the first state and the second state so as not to perform the vibrating action for the nozzle, and controls in the third state so as to perform the vibrating action for the nozzle.
Owner:FUJIFILM CORP
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