The invention discloses a
semiconductor material cleaning device, which comprises: a cleaning box capable of hierarchically cleaning a
semiconductor material in the height direction, a vibrating plateis arranged at the bottom of the cleaning box, and the vibrating plate is elastically arranged at the bottom of the cleaning box; a
liquid storage tank which is used for storing cleaning liquid, wherein the cleaning liquid is pumped into the cleaning tank through a pump body, so that the
semiconductor material is flushed by
layers in a circumferential array manner; a circulating material stirringbarrel which is in a thin-plate cylindrical shape, the top and the bottom of the circulating material stirring
barrel are open, wherein a plurality of material stirring rods are arranged on the circumferential inner side wall of the circulating material stirring
barrel; cleaning pipeline assemblies which are distributed on the inner side wall of the cleaning box in an
annular array mode; a cleaning roller
assembly which is located at the bottom of the cleaning box and conducts rolling cleaning on the semiconductor material; a driving part which can simultaneously control the circulating material stirring
barrel body and the cleaning roller
assembly to synchronously rotate; and a vibration
assembly which generates periodic vibration on the vibration plate, wherein overturning and positionreplacement of the semiconductor material are realized by matching with a material stirring rod, and therefore, the semiconductor material can be flushed more cleanly and cleaned more thoroughly, andthe cleaning efficiency and effect are improved.