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153 results about "Programming patterns" patented technology

In object-oriented programming, a pattern can contain the description of certain objects and object classes to be used, along with their attributes and dependencies, and the general approach to how to solve the problem. Often, programmers can use more than one pattern to address a specific problem.

Arbitrary waveform generator having programmably configurable architecture

An arbitrary waveform generator (AWG) for producing an analog output current signal includes a random access memory (RAM), a programmable logic device (PLD), a programmable pattern generator, several digital-to analog converters (DACS) and a current multiplexer. The RAM store data sequences representing the analog waveform to be generated. The pattern generator read addresses the RAM causing it to sequentially read out its stored data sequence to the PLD. The PLD routes selected fields of each data sequence word to one or more of the DACs in response to timing signals provided by the pattern generator. Each DAC produces an output current of magnitude determined by its input waveform and range data. The pattern generator also signals the analog multiplexer to sum currents produced by one or more selected DACs to produce the AWG output waveform. The nature of the AWG output waveform is flexibly determined by the nature of the data sequence and the frequency at which it is read out of the RAM, the manner in which the PLD routes the data sequence to the DACs, the value of the range data supplied to each DAC, and the output pattern generated by the pattern generator. The flexible AWG architecture permits the AWG to be appropriately configured for various combinations of output waveform frequency, bandwidth and resolution requirements.
Owner:CREDENCE SYSTEMS

Multi-level ONO flash program algorithm for threshold width control

Methods of programming a wordline of multi-level flash memory cells (MLB) having three or more data levels per bit corresponding to three or more threshold voltages are provided. The present invention employs an interactive program algorithm that programs the bits of the wordline of memory cells in two programming phases, comprising a rough programming phase and a fine programming phase to achieve highly compact Vt distributions. In one example, cell bit-pairs that are to be programmed to the same program pattern are selected along a wordline. Groups of sample bits are chosen for each wordline to represent each possible program level. The sample bits are then programmed to determine a corresponding drain voltage at which each sample group is first programmed. This fast-bit drain voltage (Fvd) for each program level essentially provides a wordline specific program characterization of the Vt required for the remaining bits of that wordline. In the rough programming phase, the bits of core cells are then programmed from a starting point that is relative to (e.g., slightly less than or equal to) the fast-bit Vd and according to a predetermined Vd and Vg profile of programming pulses. The bits of the complementary bit-pairs are alternately programmed in this way until the Vt of the bits attains a rough Vt level, which is offset lower than the final target threshold voltage level. Then in the second fine programming phase, the bits of the MLB cells of the wordline are further programmed with another predetermined Vd and Vg profile of programming pulses until the final target threshold voltage is achieved. The Vd and Vg profiles of programming pulses may further be tailored to accommodate the various bit-pair program pattern combinations possible. In this way, the bits of each wordline are fine-tune programmed to a data state to achieve a more precise Vt distribution, while compensating for the effects of complementary bit disturb.
Owner:LONGITUDE FLASH MEMORY SOLUTIONS LTD

Pattern inspection equipment, pattern inspection method, and storage medium storing pattern inspection program

Pattern inspection equipment has at least a measured data generation unit for generating measured data from patterns that have been delineated on a sample according to design data, a reference data generation unit for generating reference data used to inspect the patterns from gradational data expressed in multiple gradation levels, and a fault decision circuit for comparing the measured data with the reference data. The reference data generation unit has a multi-valued pattern development circuit for developing the design data into the gradational data and a fine adjustment circuit for finely shifting the positions or adjusting the curvatures of pattern edges in the pattern constructed with the gradational data. The fine adjustment of the pattern edges is necessary to cope with slightly displaced edges and rounded corners of the actual patterns on the sample. These slightly displaced edges and rounded corners are caused through mask manufacturing processes and are frequently smaller than the size of a sensor pixel. To adjust the reference data to the displaced edges, a size modification circuit detects a maximum value in a specified area in the gradational data and modifies the size of the pattern constructed with the gradational data. To adjust the reference data to match with the actual rounded corners, a corner rounding circuit rounds corners in the pattern constructed with the gradational data. Also provided is a pattern inspection method for developing the design data into the gradational data, adjusting the gradational data to displaced edges and rounded corners of the actual patterns and preparing the reference data, and testing the patterns for faults. Further provided is a storage medium for storing a pattern inspection program for realizing the pattern inspection method.
Owner:KK TOSHIBA
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