The invention belongs to the technical field of
wafer detection, and discloses a slewing device suitable for
wafer defect detection, which comprises a shell, a vacuum chuck, a rotating shaft, a driving piece, a limiting
assembly and an adjusting
assembly. At least one end of the shell is open; the vacuum chuck is rotationally connected to one end of the shell and is used for adsorbing a to-be-detected
wafer; the rotating shaft penetrates through the shell, and one end of the rotating shaft is connected with the vacuum chuck; the driving piece is arranged in the shell and is in transmission connection with the other end of the rotating shaft; the limiting
assembly is used for preventing the rotating shaft from moving in the shell in the radial direction and the axial direction. The adjusting assembly is arranged on the shell and used for adjusting the
mass eccentricity of the rotating device. The rotary device has
high load capacity, can sensitively change speed under the load working condition, guarantees the dynamic rigidity of a
system, is excellent in vibration performance and strict in bounce limitation on parts, can achieve the
national standard level G0.4 in
dynamic balance level, and can meet the operation stability of the device at a high rotating speed.