The application discloses a method for preparing a
quantum dot color conversion layer based on a microchannel and
electrophoretic deposition, which comprises the following steps: setting a
metal ring
electrode and a connecting
electrode on the periphery of an array-arranged transparent
electrode, depositing an insulating layer, opening a to-be-deposited area, using a micro-channel technology, bonding with a micro-channel cover plate, and then feeding a charged
quantum dot solution into a micro-channel passage, combining with an
electrophoretic deposition technology, so that the
quantum dot solution is deposited on the transparent electrode of the to-be-deposited area to form a
quantum dot unit. The prepared
quantum dot color conversion layer is bonded with a Micro-LED
chip array to realize full-color display. The application combines the micro-channel technology and the
electrophoretic deposition technology through the design of the
metal electrode surrounding the transparent electrode, realizes the
quantum dot color conversion layer with the advantages of small pixel size, high PPI, high
light emission uniformity, fast deposition speed, high
raw material utilization rate and being conducive to large-area preparation, and thus promotes the industrialization of the full-color Micro-LED.