The invention relates to a high-damage-threshold 
laser film technological method, and belongs to the field of 
optical film plating. The invention aims to overcome the defect that the 
laser damage resistance threshold of a 
laser film plated in visible light and near-
infrared bands by a conventional laser film plating technology is relatively low. 
Quartz or K9 is used as a 
coating substrate, 
sapphire is used as a substrate 
film material M, HfO2 is used as a high-refractive-index 
film material H, SiO2 is used as a low-refractive-index 
film material L, and TFC is used for giving geometric thicknesses and film 
system sequence calculation results of all 
layers of film systems; ultrasonic cleaning and heating baking are carried out on the 
coating substrate; in an 
optical film layer bonding bottoming process and a stress matching process, three film materials are sequentially put into an electronic gun 
evaporation source 
crucible boat, and then a 
coating process is completed according to the geometric thickness of each layer of film 
system and the sequence of the film systems; and the coating substrate is bombarded by using an 
ion source before coating and in the coating process. The filmlayer is hard, firm, excellent in 
laser damage resistance and good in permeability, and can be used for a long time in a severe field environment.