36 results about "Beam emittance" patented technology

A sensor containing a beam emitter that emits a first beam having laser, a beam-splitting interferometer and an array detector, wherein the first beam is to strike a sample that produces a second beam comprising a Raman signal, the beam-splitting interferometer is to create a phase delay in the second beam, and the array detector comprises a plurality of detectors is disclosed. The sensor could be used for spectroscopic detection of a sample by generating a first beam comprising laser, striking the first beam to a sample to produce a second beam comprising a Raman signal, creating a phase delay in the second beam and detecting the Raman signal of the second beam. The uses of the sensor include detection of biological and chemical warfare agents, narcotics, among others for homeland security.

A pattern testing board is able to detect an emission beam such as a laser or light beam from a shooting system. A pattern testing board includes a plurality of paired emission beam sensors and hit indicators. Each emission beam sensor is responsive to a detected emission beam and each hit indicator signals the sensing of the emission beam by the associated emission beam sensor. Multiple pattern testing boards may be mounted together to provide a larger pattern testing system array. Further, an overlay with a representation thereon, a moving image display system, or a reflective moving image display system may be positioned in front of one or more pattern testing boards. Still further, the pattern testing board may be incorporated in a unique target system that includes the pattern testing board for determining the beam pattern emitted by the beam emitter, a level selection board for selecting a level of play, and a targeting game board having a plurality of targets.

Techniques for measuring ion beam emittance are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for measuring ion beam emittance. The apparatus may comprise a measurement assembly comprising a first mask, a second mask, and a pivot axis, such that the measurement assembly rotates about the pivot axis in order to scan an ion beam using either the first mask or the second mask to measure ion beam emittance for providing a measure of ion beam uniformity.

A new type of beam current detector includes a housing, a metal plate, a scintillator panel and a CCD camera. The casing is provided with a detection cavity, and the two sides of the detection cavity are respectively provided with a beam inflow port and a beam outflow port for the beam to enter and exit, the beam inflow port and the beam outflow port are located on the same straight line, the detection cavity The upper end is provided with a detection window; the metal plate is hinged on the housing through a rotating shaft, the metal plate is located between the beam inflow port and the beam out port, and the metal plate can be in the first position of blocking the beam flow and avoiding the beam flow The metal plate is grounded through the galvanometer; the scintillator panel is fixed on one side of the metal plate; the CCD camera is installed outside the detection window and is used to detect the light emitted by the scintillator panel and passing through the detection window. The invention has rich measurement functions, low cost, and is easy to produce in batches. Several detectors can be installed on the beam line to monitor the beam quality of the entire beam line, and it is convenient to use.

An electron cooling system and method for increasing the phase space intensity and overall intensity of ion beams in multiple overlap regions, including a vacuum chamber to allow a single electron beam to be merged and separated with multiple ion beams, an electron supply device including a cathode to generate the electron beam, an electron collector device including a collection plate to collect the electron beam, multiple magnetic field generation devices to guide the electrons on their desired trajectories, and multiple electrodes to set the velocity of the electron beam independently in each overlap region. By overlapping the electron and ion beams, thermal energy is transferred from the ion beams to the electron beam, which allows an increase in the phase space density and overall density of the ion beams. Advantageously, the electron cooling system uses multiple magnetic field generation devices to guide the electrons into and out of multiple, separate, ion beam overlap regions, allowing the single electron beam to cool an ion beam in more than one overlap region. Advantageously, the electron cooling system uses electrodes to control the mean electron beam velocity in each overlap region, allowing for mitigation of electron beam emittance growth caused by scattering that occurs exterior to the overlap regions. Advantageously, the electrodes used to control the mean electron beam velocity in each overlap region allow for a single electron beam to achieve different velocities to match different desired ion beam velocities in the multiple overlap regions.

The invention discloses an equalizing method of beam emittance, including the followings: according to the beam type and energy, one of plain solenoid, superconducting solenoid and beam gyrator is used as an emittance equalizing unit; the mounting space of the emittance equalizing unit is arranged on the beam transmission line; the inlets of the emittance equalizing unit and the gyrator respectively carries out matching of TWISS parameters so that the TWISS parameters in horizontal phase space and vertical phase space are equal; a required beam angle of rotation is set for the emittance equalizing unit; normal beam spot size matching is carried out, and the matching of beam slope angle in real space X-Y phase plane of beam cross-section is carried out; and when the energy of curing beam is changed, the magnetic setting of the beam emittance equalizing unit is simultaneously adjusted with the whole beam transmission system. The application of the invention can carry out equalizing process for beam emittance in horizontal and vertical directions so that the beam optics remains the same in the gyrator.

To provide a functional membrane for ion beam transmission capable of enhancing ion beam transmittance and improving beam emittance. A functional membrane for ion beam transmission according to the present invention is used in a beam line device through which an ion beam traveling in one direction passes and has a channel. The axis of the channel is substantially parallel to the travel direction of the ion beam.