36 results about "Beam emittance" patented technology

A system and method for limiting emittance growth in an electron beam is disclosed. The system includes an emitter element configured to generate an electron beam and an extraction electrode positioned adjacent to the emitter element to extract the electron beam out therefrom, the extraction electrode including an opening therethrough. The system also includes a meshed grid disposed in the opening of the extraction electrode to enhance intensity and uniformity of an electric field at a surface of the emitter element and an emittance compensation electrode (ECE) positioned adjacent to the meshed grid on the side of the meshed grid opposite that of the emitter element and configured to control emittance growth of the electron beam.

A laser illumination system, for use with an automobile, comprising a plurality of modules. Each module has a housing having a lens, and a mode selection switch for choosing between headlight and taillight modes. Preferably, two modules are mounted at the front of the automobile to function as headlights, and two of the modules are mounted at the rear of the automobile to function as taillights. Each module has a beam emitter which produces an initial beam of laser light and an output mirror which directs an exit beam through the lens, outwardly of the automobile, and ultimately creates a cone of light at the ground surface forwardly or rearwardly of the automobile. When used as a headlight and the mode selection switch is appropriately set, an output mirror rotation motor spreads the output beam so that it creates a larger cone on the ground surface.

The invention relates to a device and method for simultaneously measuring beam intensity and beam emittance. The device mainly comprises position sampling slit plates in a horizontal direction and a vertical direction, angle sampling slit plates in a horizontal direction and a vertical direction, and a vacuum system. During the measurement of beam intensity, the intensity of an incident particle beam is obtained according to the sum of the currents received by Faraday cylinders at the position sampling slit plates, the angle sampling slit plates and Faraday cylinders behind the angle samplingslit plates. During the measurement of beam emittance, the position and the divergence angle of the beam are sampled under the driving of a motor, and the beam emittance is measured by measuring the positions of the two slit plates and a current signal received by the angle sampling slit plates. The device is compact in structure, easy to operate and easy to miniaturize, can measure the emittanceof the beam in both the horizontal and vertical directions, can also measure the intensity of the beam, is very suitable for the beam parameter measurement of a low-energy high-intense proton beam.

A method and apparatus for controlling beam emittance by placing a lens array in a drift space of an illumination system component. The illumination system component may be an electron gun or a liner tube or drift tube, attachable to an electron gun. The lens array may be one or more mesh grids or a combination of grids and continuous foils. The lens array forms a multitude of microlenses resembling an optical “fly's eye” lens. The lens array splits an incoming solid electron beam into a multitude of subbeams, such that the outgoing beam emittance is different from the incoming beam emittance, while beam total current remains unchanged. The method and apparatus permit independent control of beam current and beam emittance, which is beneficial in a SCALPEL illumination system.

A sensor containing a beam emitter that emits a first beam having laser, a beam-splitting interferometer and an array detector, wherein the first beam is to strike a sample that produces a second beam comprising a Raman signal, the beam-splitting interferometer is to create a phase delay in the second beam, and the array detector comprises a plurality of detectors is disclosed. The sensor could be used for spectroscopic detection of a sample by generating a first beam comprising laser, striking the first beam to a sample to produce a second beam comprising a Raman signal, creating a phase delay in the second beam and detecting the Raman signal of the second beam. The uses of the sensor include detection of biological and chemical warfare agents, narcotics, among others for homeland security.

Comparing with previous research, the invention combines measuring and focusing beam flux. Computer (PC) controls automatic measuring and focusing. Computer sends the measuring commands, reads data, obtains parameters of transmittance, from which the beam flux parameter and focusing parameter are obtained through calculation. The focusing parameter is passed to focusing device (lens) in order to improve quality of beam flux. As the quality of beam flux is raised, the chance of collision between beam flux and viewfinder is reduced. The beam spot will reduced to 2-3 mum or even less. The invention can be applied to monitoring beam flux and improving quality of beam in accelerator automatically, especially the device needed of small beam spot as well as ion optics, electron optics and particle accelerator.

A pattern testing board is able to detect an emission beam such as a laser or light beam from a shooting system. A pattern testing board includes a plurality of paired emission beam sensors and hit indicators. Each emission beam sensor is responsive to a detected emission beam and each hit indicator signals the sensing of the emission beam by the associated emission beam sensor. Multiple pattern testing boards may be mounted together to provide a larger pattern testing system array. Further, an overlay with a representation thereon, a moving image display system, or a reflective moving image display system may be positioned in front of one or more pattern testing boards. Still further, the pattern testing board may be incorporated in a unique target system that includes the pattern testing board for determining the beam pattern emitted by the beam emitter, a level selection board for selecting a level of play, and a targeting game board having a plurality of targets.

Techniques for measuring ion beam emittance are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for measuring ion beam emittance. The apparatus may comprise a measurement assembly comprising a first mask, a second mask, and a pivot axis, such that the measurement assembly rotates about the pivot axis in order to scan an ion beam using either the first mask or the second mask to measure ion beam emittance for providing a measure of ion beam uniformity.

The invention discloses a micron dimension conversion target device for electron beam emittance measurement. The micron dimension conversion target device includes a lower circular seat, the upper end face of the lower circular seat forms a circular groove by recessing inward along the axis and further includes an upper circular seat matched with the lower circular seat, the lower surface of the upper circular seat is provided with a protruding ring protruding downwards and matched with the circular groove of the lower circular seat, and after the protruding ring of the upper circular seat is inserted into the circular groove of the lower circular seat, the film paved on the lower circular seat is expanded to form a minute surface. The micron dimension conversion target device overcomes the defects that a quartz slice is small in size, inconvenient to clean, easy to damage, and inconvenient to install, achieves the aims of simple use, convenient maintaining, and low cost, has the same measurement precision in the various calibers having the diameter ranging from 30-200mm, and greatly improves the adaptive caliber relative to the quartz slice only allowing the diameter of 50-60mm.

A new type of beam current detector includes a housing, a metal plate, a scintillator panel and a CCD camera. The casing is provided with a detection cavity, and the two sides of the detection cavity are respectively provided with a beam inflow port and a beam outflow port for the beam to enter and exit, the beam inflow port and the beam outflow port are located on the same straight line, the detection cavity The upper end is provided with a detection window; the metal plate is hinged on the housing through a rotating shaft, the metal plate is located between the beam inflow port and the beam out port, and the metal plate can be in the first position of blocking the beam flow and avoiding the beam flow The metal plate is grounded through the galvanometer; the scintillator panel is fixed on one side of the metal plate; the CCD camera is installed outside the detection window and is used to detect the light emitted by the scintillator panel and passing through the detection window. The invention has rich measurement functions, low cost, and is easy to produce in batches. Several detectors can be installed on the beam line to monitor the beam quality of the entire beam line, and it is convenient to use.

An electron cooling system and method for increasing the phase space intensity and overall intensity of ion beams in multiple overlap regions, including a vacuum chamber to allow a single electron beam to be merged and separated with multiple ion beams, an electron supply device including a cathode to generate the electron beam, an electron collector device including a collection plate to collect the electron beam, multiple magnetic field generation devices to guide the electrons on their desired trajectories, and multiple electrodes to set the velocity of the electron beam independently in each overlap region. By overlapping the electron and ion beams, thermal energy is transferred from the ion beams to the electron beam, which allows an increase in the phase space density and overall density of the ion beams. Advantageously, the electron cooling system uses multiple magnetic field generation devices to guide the electrons into and out of multiple, separate, ion beam overlap regions, allowing the single electron beam to cool an ion beam in more than one overlap region. Advantageously, the electron cooling system uses electrodes to control the mean electron beam velocity in each overlap region, allowing for mitigation of electron beam emittance growth caused by scattering that occurs exterior to the overlap regions. Advantageously, the electrodes used to control the mean electron beam velocity in each overlap region allow for a single electron beam to achieve different velocities to match different desired ion beam velocities in the multiple overlap regions.

The invention belongs to the technical field of particle accelerators, and relates to a passive energy reducer device for regulating the energy of particles extracted from an accelerator, in particular to a wheel axle type particle accelerator energy reducing device and energy reducing method which can be used in vacuum. The energy reducer includes a rotary driving mechanism, a rotary disk on which a plurality of energy reducing stop blocks are mounted and a vacuum system. The vacuum system enables the rotary disk and the energy reducing stop blocks to be in a vacuum environment, and the rotary disk is rotated through the rotary driving mechanism, thereby changing the thickness of the energy reducing stop blocks at a beam position to realize energy adjustment. The energy reducer has a compact structure, which is in favor of miniaturization; a magnetic fluid sealing transmission device is adopted, and thus vacuum reliability is high; a wheel axle type structure is adopted, rapid adjustment of different energy can be realized; the energy reducing stop blocks are convenient to dismount, thereby facilitating replacement; and the energy reducing method is a non-superposition type energyreducing method, and has little influence on beam emittance.

The invention discloses an equalizing method of beam emittance, including the followings: according to the beam type and energy, one of plain solenoid, superconducting solenoid and beam gyrator is used as an emittance equalizing unit; the mounting space of the emittance equalizing unit is arranged on the beam transmission line; the inlets of the emittance equalizing unit and the gyrator respectively carries out matching of TWISS parameters so that the TWISS parameters in horizontal phase space and vertical phase space are equal; a required beam angle of rotation is set for the emittance equalizing unit; normal beam spot size matching is carried out, and the matching of beam slope angle in real space X-Y phase plane of beam cross-section is carried out; and when the energy of curing beam is changed, the magnetic setting of the beam emittance equalizing unit is simultaneously adjusted with the whole beam transmission system. The application of the invention can carry out equalizing process for beam emittance in horizontal and vertical directions so that the beam optics remains the same in the gyrator.

The invention provides a high-voltage electrostatic acceleration tube for strong current ions, which includes an acceleration tube body; the acceleration tube body specifically includes an inlet cylinder, an inlet flange, an inlet flange jacket, a magnetic mirror device, an accelerating electrode, and a double electron cloud space charge Lens device, outlet flange jacket, outlet flange, outlet cylinder, insulation ring, pressure equalizing ring and insulation column, etc.; there is a magnetic mirror device between the inlet flange jacket and the inlet cylinder, and the outlet flange jacket A double electron cloud space charge lens device is arranged between the exit cylinder and the radius of the central circular hole of each accelerating electrode decreases sequentially along the beam transmission direction. The present invention utilizes the focusing electric field and the beam-plasma interaction to respectively enhance the ion focusing force in the acceleration area and the area of ​​the entrance and exit of the acceleration tube, suppress the beam dispersion caused by the strong space charge effect under the condition of a strong ion beam, and reduce the beam loss and inhibition The increase of the beam emittance can realize the efficient and stable acceleration of the high-current ion beam.

The invention belongs to the technical field of particle accelerators, and relates to a passive energy reducer device for regulating the energy of particles extracted from an accelerator, in particular to a wheel axle type particle accelerator energy reducing device and energy reducing method which can be used in vacuum. The energy reducer includes a rotary driving mechanism, a rotary disk on which a plurality of energy reducing stop blocks are mounted and a vacuum system. The vacuum system enables the rotary disk and the energy reducing stop blocks to be in a vacuum environment, and the rotary disk is rotated through the rotary driving mechanism, thereby changing the thickness of the energy reducing stop blocks at a beam position to realize energy adjustment. The energy reducer has a compact structure, which is in favor of miniaturization; a magnetic fluid sealing transmission device is adopted, and thus vacuum reliability is high; a wheel axle type structure is adopted, rapid adjustment of different energy can be realized; the energy reducing stop blocks are convenient to dismount, thereby facilitating replacement; and the energy reducing method is a non-superposition type energyreducing method, and has little influence on beam emittance.

To provide a functional membrane for ion beam transmission capable of enhancing ion beam transmittance and improving beam emittance. A functional membrane for ion beam transmission according to the present invention is used in a beam line device through which an ion beam traveling in one direction passes and has a channel. The axis of the channel is substantially parallel to the travel direction of the ion beam.

PROBLEM TO BE SOLVED: To provide a multiple beam axis photoelectric sensor which can override the beam receiving signal from an optional beam receiving element for a predetermined time. SOLUTION: The multiple beam axis photoelectric sensor is provided with a beam emitter 1 equipped with two or more beam emitting elements 11a-11l and with a beam receiver 2 equipped with two and more beam receiving elements 21a-21l each of which constitutes a channel respectively in a pair with its counterpart in beam emitting elements 11a-11l, performing detection operation one by one for each channel based on whether or not the beam from each of emitting element 11a-11l is received by each of receiving element 21a-21l in the same channel. Optional channels among the two or more channels are designated by an external console 30 and also the designation is memorized to a memory 25A, therefore, a CPU 25 on the beam receiving side overrides, for only a predetermined period, beam receiving signals of the receiving elements 21a-21l consisting of the channels designated by the external console, based on the control signal which is input from an external control circuit through an input port 27. COPYRIGHT: (C)2004,JPO&NCIPI

The invention discloses a micron dimension conversion target device for electron beam emittance measurement. The micron dimension conversion target device includes a lower circular seat, the upper end face of the lower circular seat forms a circular groove by recessing inward along the axis and further includes an upper circular seat matched with the lower circular seat, the lower surface of the upper circular seat is provided with a protruding ring protruding downwards and matched with the circular groove of the lower circular seat, and after the protruding ring of the upper circular seat is inserted into the circular groove of the lower circular seat, the film paved on the lower circular seat is expanded to form a minute surface. The micron dimension conversion target device overcomes the defects that a quartz slice is small in size, inconvenient to clean, easy to damage, and inconvenient to install, achieves the aims of simple use, convenient maintaining, and low cost, has the same measurement precision in the various calibers having the diameter ranging from 30-200mm, and greatly improves the adaptive caliber relative to the quartz slice only allowing the diameter of 50-60mm.