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40results about How to "Accuracy and efficiency" patented technology

Rotary Compressor

Disclosed is a rotary compressor having two compression capacities. The rotary compressor includes: a driving shaft (13) being rotatable clockwise and counterclockwise, and having an eccentric portion (13a) of a predetermined size; a cylinder (21) forming a predetermined inner volume; a roller (22) installed rotatably on an outer circumference of the eccentric portion (13a) so as to contact an inner circumference of the cylinder (21), performing a rolling motion along the inner circumference and forming a fluid chamber (29) to suck and compress fluid along with the inner circumference; a vane (23) installed elastically in the cylinder to contact the roller (22) continuously; a first bearing (24) installed in the cylinder (21), for rotatably supporting the driving shaft (13); a second bearing (300) installed in the cylinder (21), for rotatably supporting the driving shaft (13) and guiding the fluid into the fluid chamber (29); discharge ports (26) communicating with the fluid chamber (29); and a valve assembly (400) having openings (411, 412) separated by a predetermined angle from each other, for allowing the openings (411, 412) to selectively introduce the fluid into the fluid chamber (29) through the second bearing (300) at a predetermined position of the fluid chamber (29) according to rotation direction of the driving shaft (13), the valve assembly (400) having a center (410a) which is eccentrically installed by a predetermined distance from a center of the cylinder (29).
Owner:LG ELECTRONICS INC

Differential alternating phase shift mask optimization

A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width. The method comprises creating a first mask design by aligning mask features used to assist in projecting critical width segments with the critical width segments of the integrated circuit design, such that the first mask design meets predetermined manufacturability design rules, and creating a second mask design by aligning mask features with the critical width segments of the integrated circuit design, such that the second mask design meets predetermined lithographic design rules in regions local to the critical width segments. The method then includes identifying design features of the second mask design that violate the predetermined manufacturability design rules, and then creating a third mask design derived from the second mask design wherein the mask features of the second mask design that violate the predetermined manufacturability rules are selectively replaced by mask features from the first mask design so that the third mask design meets the predetermined manufacturability design rules. By way of example, the mask features used to assist in projecting critical width segments may comprise alternating phase shifting regions or sub-resolution assist features.
Owner:GLOBALFOUNDRIES INC

Differential alternating phase shift mask optimization

A method of designing a mask for projecting an image of an integrated circuit design in lithographic processing, wherein the integrated circuit layout has a plurality of segments of critical width. The method comprises creating a first mask design by aligning mask features used to assist in projecting critical width segments with the critical width segments of the integrated circuit design, such that the first mask design meets predetermined manufacturability design rules, and creating a second mask design by aligning mask features with the critical width segments of the integrated circuit design, such that the second mask design meets predetermined lithographic design rules in regions local to the critical width segments. The method then includes identifying design features of the second mask design that violate the predetermined manufacturability design rules, and then creating a third mask design derived from the second mask design wherein the mask features of the second mask design that violate the predetermined manufacturability rules are selectively replaced by mask features from the first mask design so that the third mask design meets the predetermined manufacturability design rules. By way of example, the mask features used to assist in projecting critical width segments may comprise alternating phase shifting regions or sub-resolution assist features.
Owner:GLOBALFOUNDRIES INC
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