33results about How to "Increase the output capacitance" patented technology

An MOS device includes a semiconductor layer of a first conductivity type and first and second source / drain regions of a second conductivity type formed in the semiconductor layer proximate an upper surface of the semiconductor layer. The first and second source / drain regions are spaced apart relative to one another. A gate is formed above and electrically isolated from the semiconductor layer, at least partially between the first and second source / drain regions. At least a given one of the first and second source / drain regions is configured having an effective width that is substantially greater than a width of a junction between the semiconductor layer and the given source / drain region.

A semiconductor device includes a semiconductor substrate having a conductive type, a source metal layer, a gate metal layer, at least one transistor device, a heavily doped region having the conductive type, a capacitor dielectric layer, a conductive layer. The source metal layer and the gate metal layer are disposed on the semiconductor substrate. The transistor device is disposed in the semiconductor substrate under the source metal layer. The heavily doped region, the capacitor dielectric layer and the conductive layer constitute a capacitor structure, disposed under the gate metal layer, and the capacitor structure is electrically connected between a source and a drain of the transistor device.

A power semiconductor device having adjustable output capacitance includes a semiconductor substrate having a first device region and a second device region defined thereon, at lest one power transistor device disposed in the first device region, a heavily doped region disposed in the semiconductor substrate of the second device region, a capacitor dielectric layer disposed on the heavily doped region, a source metal layer disposed on a top surface of the semiconductor substrate and electrically connected to the power transistor device, and a drain metal layer disposed on a bottom surface of the semiconductor substrate. The source metal layer in the second device, the capacitor dielectric layer and the heavily doped region form a snubber capacitor.

A grayscale voltage generator circuit that is less likely to be influenced by the offset voltage is provided. The grayscale voltage generator circuit is a semiconductor device that includes a D / A converter circuit, a first Gm amplifier, a second Gm amplifier, a current control circuit, an output buffer, and a selector circuit. The D / A converter circuit generates a first voltage and a second voltage from an upper bit of a digital signal. The current control circuit generates a first current from a lower bit of the digital signal and functions as a current source of the first Gm amplifier. The output buffer generates a third voltage from currents output from the first Gm amplifier and the second Gm amplifier. The third voltage is input to the second Gm amplifier. The selector circuit selects voltages that are to be input to the first Gm amplifier and the second Gm amplifier.

A high voltage semiconductor device is provided and includes an n−-type region encompassed by a p− well region and is provided on a p−-type silicon substrate. A drain n+-region is connected to a drain electrode. A p base region is formed so as to be separate from and encompass the drain n+-region. A source n+-region is formed in the p base region. Further, a p−-region is provided that passes through the n−-type region to the silicon substrate. The n−-type region is divided, by the p−-region, into a drift n−-type region having the drain n+-region and a floating n−-type region having a floating electric potential.

The invention discloses a manufacturing method of an RFLDMOS (radio frequency laterally diffused metal oxide semiconductor) device. The manufacturing method comprises steps as follows: a P-type epitaxial layer is formed on a silicon substrate; a first liner oxide layer and a second silicon nitride layer are sequentially formed; a forming region of a thick field oxide layer is defined, and a hard mask layer in the region is removed; multiple deep grooves are formed in the forming region of the thick field oxide layer; third thermal oxidation layers are formed in the forming region of the thick field oxide layer; fourth polycrystalline silicon layers are deposited, the deep grooves are completely filled with the fourth polycrystalline silicon layers, and an etch-back process is performed; a forming region of a fishbone gate is defined, and a hard mask layer in the region is removed; thermal oxidation is performed, fourth thermal oxidation layers are formed at the tops of the fourth polycrystalline silicon layers and a fifth thermal oxidation layer is formed in the forming region of the fishbone region; CMP (chemical mechanical polishing) flattening is performed; a gate oxide layer and a polysilicon gate are sequentially formed; a P well, an N-type drift region, a source region, a drain region and a P-well extraction region are formed. The manufacturing method enables a manufacturing process of the liner oxide layer under the fishbone gate to be simple and reduces the process cost.

There is provided an output driver for use in a semiconductor device capable of remarkably improving linearity of impedance by reducing or minimizing a change of an impedance for output data caused due to a change of an external power supply. The output driver for outputting internal data of a semiconductor device to the exterior of a chip comprises a first driving section including a driving transistor to maintain an impedance for applied data at a certain level in response to the data; and a second driving section for compensating for linearity of the impedance in response to an operation signal from the driving transistor of the first driving section and providing an output terminal with the data.

The invention relates to a synchronous resonance-based high-sensitivity voltage, resistance and capacitance superposition force sensor and belongs to the field of synchronous resonance cantilever force sensors capable of realizing voltage, resistance and capacitance superposition. The lower part of a C-shaped supporting structure is fixedly connected with a piezoelectric excitation structure; the middle part of the C-shaped supporting structure is connected with a U-shaped beam, a T-shaped beam and a synchronous coupling beam; two sides of the T-shaped beam is connected with the synchronous coupling beam; the inner side of the U-shaped beam is connected with the synchronous coupling beam; a plurality of piezoelectric vibration pick-up structures are deposited on the surface of the T-shaped beam; the surface of the fixed end of the T-shaped beam is provided with a piezoresistance vibration pick-up structure; and two capacitance vibration pick-up structures form a differential capacitance vibration pick-up structure. The force sensor of the invention is novel in structure. Based on simple structure design, the piezoelectric, piezoresistance and capacitance vibration pick-up structures are integrated in the same structure, the output signals of the three structures are superposed, and therefore, output voltage can be further amplified, and the detection sensitivity of the sensor can be improved.

The invention provides a double-tube flexible capacitive liquid level sensor and a measuring method thereof. The double-tube flexible capacitive liquid level sensor is provided with a single-stranded insulating copper core wire, two cylinders, end plates, cable head clamping assemblies, a spring and signal outgoing cables. The two cylinders are installed side by side at the same height, and the two end plates are installed at the two ends of the cylinders respectively and used for fixing the cable head clamping assemblies. The spring is placed between the two cylinders, and the spring is fixed to the end plates at the upper ends of the cylinders. The single-stranded insulating copper core wire penetrates through the two cylinders in a U shape and is fixed through the cable head clamping assemblies to serve as a metal electrode. The cylinders or a conducting medium serves as another electrode. The signal outgoing cables are arranged on the side walls of the first cylinder and the second cylinder. The double-tube flexible capacitive liquid level sensor is simultaneously suitable for measuring the liquid levels of the conducting medium, a non-conducting medium and different kinds of liquid, the measuring range can be adjusted according to the practical working condition, and the advantages that output capacitance is large, measuring precision is high, and the measuring range is convenient to adjust are achieved.

The invention discloses a lateral diffusion metal oxide semiconductor assembly. The lateral diffusion metal oxide semiconductor assembly comprises a substrate, a gate dielectric layer, a gate polycrystalline silicon layer, a source region, a drain region, a matrix region, a first drain contact plug, a source polycrystalline silicon layer, an insulating layer and a source metal layer, wherein the source polycrystalline silicon layer arranged on the gate dielectric layer above the drain region is utilized to be served as a field plate so as to advance the breakdown voltage and improve the capacitance between a drain electrode and a source electrode. Besides, the first drain contact plug in the invention can effectively reduce the extended length of an on-resistance and the lateral between the drain electrode and the source electrode, thus the power consumption can be reduced and the assembly integration can be increased.