The invention discloses a four-gate
field effect transistor, a preparation method thereof and a bistable circuit. The four-gate
field effect transistor comprises a
semiconductor substrate; a
buried oxide layer located on the
semiconductor substrate; the junction gate layer and the
active layer are located on the
buried oxide layer; the junction gate layer comprises a first junction gate and a second junction gate; the
active layer comprises a source region and a drain region; the channel region is located between the source region and the drain region, and the channel region is located between the first junction gate and the second junction gate; the top gate is positioned on the channel region; an isolation region; the channel region comprises a first channel located between the first junction gate and the isolation region; the second channel is positioned between the second junction gate and the isolation region; the top gate comprises a first gate and a second gate; the source region comprises a first source
electrode and a
second source electrode; the drain region comprises a first drain
electrode and a second drain electrode; the first grid electrode is electrically connected with the second drain electrode and the second junction gate, and a first input
voltage is accessed; the second grid electrode is electrically connected with the first drain electrode and the first junction gate, and a second input
voltage is accessed; the isolation region is grounded; the first source electrode and the
second source electrode are connected with
power supply voltage.