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56results about How to "Narrow down the scan range" patented technology

Polygonal rasterisation parallel conversion method based on scanning line method

The invention discloses a polygonal rasterisation parallel conversion method based on a scanning line method, belonging to the field of a geographic information system. The polygonal rasterisation parallel conversion method comprises inputting a command line parameter; carrying out MPI (Message Passing Interface) parallel initialization so as to obtain a total progress number and a current progress number; adopting an equal parallel mode, analyzing the command line parameter in each progress respectively, collecting parameter values behind a leading indicator respectively, reading a vector data source by using an OGROpen method, and judging whether the progress is the No.0 progress; adopting a data parallel strategy, dividing a raster data set vector polygon to be distributed to all progresses, and carrying out rasterisation of a polygon in each progress at the same time; writing the raster data, updating a raster block in each progress and outputting the converted raster data. The method is utilized to perform polygonal rasterisation of large amount of data to achieve relatively high efficiency and a satisfying conversion result, the conversion processing speed of a multi-core / multiprocessor of a high performance server to polygonal rasterisation is improved sufficiently, and the conversion time of polygonal rasterisation is shortened greatly.
Owner:NANJING UNIV

Lithographic apparatus and device manufacturing method

A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.
Owner:ASML NETHERLANDS BV

MPPT (maximum power point tracking) scanning method for photovoltaic arrays

Embodiment of the invention discloses a MPPT (maximum power point tracking) scanning method and system for photovoltaic arrays and solves the problems of high energy loss and failure in scanning actual global maximum power points in the prior art. The method includes: determining a scan voltage range; determining local maximum power points so as to determine a first reference point and a turning point; comparing the current of the first reference point to that of the turning point so as to determine whether scanning is performed on the reference point or not; if yes, scanning to determine the local maximum power points so as to determine a next reference point and a next turning point; if not, directly determining the next reference point and the next turning point; if the newly determined reference point has the voltage exceeding the determined scan voltage range, ending the scanning; if the newly determined reference point has the voltage not exceeding the determined scan voltage range, re-comparing the current of the reference point to that the turning point so as to determine whether to scan around the reference point or not, and continuing to execute till the end of scanning according to the previous steps; after scanning, using the maximum on of the local maximum power points as the maximum power point of one photovoltaic array.
Owner:SUNGROW POWER SUPPLY CO LTD

Lithographic apparatus and device manufacturing method

A lithographic apparatus including an illumination system for supplying a plurality of beams of radiation, an array of individually controllable elements for imparting to each beam a pattern in its cross section, a substrate table for supporting a substrate, and projection systems for projecting the patterned beams onto the substrate. A displacement system causes relative displacement between the substrate and the projection systems such that the projections beams are scanned across the substrate in a predetermined scanning direction. Each projection system includes an array of lenses arranged such that each lens in the array directs a respective part of the respective beam towards a respective target area on the substrate. The projection systems are arranged in groups such that lenses in the arrays of different groups direct parts of different beams to different target areas of the substrate that are aligned in the scanning direction. The groups of projection systems are spaced apart in the scanning direction and each group directs beams towards target areas of the substrate that are contiguous and occupy a respective contiguous section of the substrate. Thus different sections of the substrate are exposed by different groups of projection systems, enabling high through put with relatively low substrate displacement speeds and relatively small substrate displacements.
Owner:ASML NETHERLANDS BV
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