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36 results about "Fundamental pattern" patented technology

Fundamental patterns are one of the types of design patterns. They are termed fundamental as they form the basic building blocks of the other patterns. Most of the other patterns and most modern applications draw on these patterns in one way or another. Examples of this class of patterns include: Delegation pattern: an object outwardly expresses certain behaviour but in reality delegates responsibility Functional design: strives for each modular part of a computer program has only one responsibility and performs that with minimum side effects Interface pattern: method for structuring programs so that they're simpler to understand Proxy pattern: an object functions as an interface to another, typically more complex, object Facade pattern: provides a simplified interface to a larger body of code, such as a class library. Composite pattern: defines Composite object designed as a composition of one-or-more similar objects, all exhibiting similar functionality. The Composite object then exposes properties and methods for child objects manipulation as if it were a simple object.

Optical waveguide structures

The purely bound electromagnetic modes of propagation supported by waveguide structures comprised of a thin lossy metal film of finite width embedded in an infinite homogeneous dielectric have been characterized at optical wavelengths. One of the fundamental modes supported by the structure exhibits very interesting characteristics and is potentially quite useful. It evolves with decreasing film thickness and width towards the TEM wave supported by the background (an evolution similar to that exhibited by the sb mode in symmetric metal film slab waveguides), its losses and phase constant tending asymptotically towards those of the TEM wave. Attenuation values can be well below those of the sb mode supported by the corresponding metal film slab waveguide. Low mode power attenuation in the neighbourhood of 10 to 0.1 dB/cm is achievable at optical communications wavelengths, with even lower values being possible. Carefully selecting the film's thickness and width can make this mode the only long-ranging one supported. In addition, the mode can have a field distribution that renders it excitable using an end-fire approach. The existence of this mode renders the finite-width metal film waveguide attractive for applications requiring short propagation distances and 2-D field confinement in the transverse plane, enabling various devices to be constructed, such as couplers, splitters, modulators, interferometers, switches and periodic structures. Under certain conditions, an asymmetric structure can support a long-ranging mode having a field distribution that is suitable to excitation using an end-fire technique. Like asymmetric slab waveguides. The attenuation of the long-ranging mode near cutoff decreases very rapidly, much more so than the attenuation related to the long-ranging mode in a similar symmetric structure. The cutoff thickness of a long-ranging mode in an asymmetric finite-width structure is larger than the cutoff thickness of the sb mode in a similar asymmetric slab waveguide. This implies that the long-ranging mode supported by an asymmetric finite-width structure is more sensitive to the asymmetry in the structure compared to the sb mode supported by a similar slab waveguide. This result is interesting and potentially useful in that the propagation of such a mode can be affected by a smaller change in the dielectric constant of the substrate or superstrate compared with similar slab structures.
Owner:UNIVERSITY OF OTTAWA

Optical waveguide structures

The purely bound electromagnetic modes of propagation supported by waveguide structures comprised of a thin lossy metal film of finite width embedded in an infinite homogeneous dielectric have been characterized at optical wavelengths. One of the fundamental modes supported by the structure exhibits very interesting characteristics and is potentially quite useful. It evolves with decreasing film thickness and width towards the TEM wave supported by the background (an evolution similar to that exhibited by the sb mode in symmetric metal film slab waveguides), its losses and phase constant tending asymptotically towards those of the TEM wave. Attenuation values can be well below those of the sb mode supported by the corresponding metal film slab waveguide. Low mode power attenuation in the neighborhood of 10 to 0.1 dB / cm is achievable at optical communications wavelengths, with even lower values being possible. Carefully selecting the film's thickness and width can make this mode the only long-ranging one supported. In addition, the mode can have a field distribution that renders it excitable using an end-fire approach. The existence of this mode renders the finite-width metal film waveguide attractive for applications requiring short propagation distances and 2-D field confinement in the transverse plane, enabling various devices to be constructed, such as couplers, splitters, modulators, interferometers, switches and periodic structures. Under certain conditions, an asymmetric structure can support a long-ranging mode having a field distribution that is suitable to excitation using an end-fire technique. Like asymmetric slab waveguides. The attenuation of the long-ranging mode near cutoff decreases very rapidly, much more so than the attenuation related to the long-ranging mode in a similar symmetric structure. The cutoff thickness of a long-ranging mode in an asymmetric finite-width structure is larger than the cutoff thickness of the sb mode in a similar asymmetric slab waveguide. This implies that the long-ranging mode supported by an asymmetric finite-width structure is more sensitive to the asymmetry in the structure compared to the sb mode supported by a similar slab waveguide. This result is interesting and potentially useful in that the propagation of such a mode can be affected by a smaller change in the dielectric constant of the substrate or superstrate compared with similar slab structures.
Owner:UNIVERSITY OF OTTAWA

Testing module, testing apparatus and testing method

There is provided a testing module including a designation information storing section that stores thereon designation information designating an order of decoding fundamental patterns, a fundamental pattern storing section that stores thereon the fundamental patterns in a data form, a plurality of pattern generating sections each of which has a designation information temporary storing section that temporarily stores thereon part of the designation information, where each pattern generating section generates a test pattern to be supplied to a device under test by decoding the fundamental patterns in an order designated by the partial designation information stored on the designation information temporary storing section, a plurality of position information storing sections each of which stores thereon, in association with a corresponding one of the plurality of pattern generating sections, position information designating a read position from which the designation information is read from the designation information storing section, and an information transmission path that is shared by the plurality of pattern generating sections, where the information transmission path transmits the partial designation information from the designation information storing section to the designation information temporary storing section in each pattern generating section.
Owner:ADVANTEST CORP

Fundamental pattern discovery using the position indices of symbols in a sequence of symbols

The present invention relates to computer-implemented methods for finding patterns in patterns in a set of k-sequences of symbols (where k>2) and to a computer readable medium having instructions for controlling a computer system to perform the methods. Patterns of symbols common to each 2-tuple of sequences are identified. Each identified pattern of symbols is represented by a position index numerical array (PINA), which is a set of position indices, each of which denotes the location in a selected reference sequence at which each symbol in the pattern occurs. The position index numerical array (PINA) representations of patterns of each tuple at any order “n” may be combined with the PINA pattern representations of all other tuples at that same order “n” or with the pattern representations in any selected m-tuple, where m may have any integer value from 2 to (n−1). The patterns in the resulting tuple are identified from the position index numerical arrays (PINAs) produced by the intersection of the set of position indices in each position index numerical array (PINA) in one tuple with the set of position indices in each position index numerical array (PINA) in the other tuple. The intersection is performed by sequentially comparing each position index of one pattern with each of the position indices of the other pattern. The position index numerical array representing the identified pattern in the resulting tuple is converted into its corresponding symbols by mapping the indices in the numerical array to the respective symbols in the reference sequence.
Owner:EI DU PONT DE NEMOURS & CO

Method for designing a modulated metasurface antenna structure

A method for designing a surface pattern for an impedance surface which results in a position-dependent target impedance of said impedance surface, and the impedance surface having the position-dependent target impedance radiates a desired first-type electromagnetic field radiation in reaction to being irradiated by a second-type electromagnetic field radiation. The method includes obtaining a first modal representation on the basis of the first-type electromagnetic field radiation in terms of a set of base modes that are chosen in accordance with a model function of the position-dependent target impedance, and obtaining a second modal representation on the basis of the second-type electromagnetic field radiation and the model function in terms of the set of base modes. The method further includes obtaining a first position-dependent quantity indicative of the position-dependent target impedance on the basis of the first modal representation and the second modal representation by determining values for a plurality of parameters of the model function for maximizing an overlap between the first modal representation and the second modal representation, and obtaining, as the surface pattern, a second position-dependent quantity indicative of geometric characteristics of the impedance surface on the basis of the first position-dependent quantity and a relationship between geometric characteristics of the impedance surface and corresponding impedance values.
Owner:EUROPEAN SPACE AGENCY

Method and system for verifying equivalence of two representations of a stimulus pattern for testing a design

A method for verifying the equivalence of two representations of a stimulus pattern for testing a design is disclosed. The method includes receiving a base pattern file representing the stimulus pattern in a first file format. A derivative pattern file in a second file format is generated from the base pattern file. The derivative pattern file is parsed to create a first testing file in a third file format, and the first testing file is simulated against the design in a first simulation. Whether the first testing file passed the first simulation against the design is determined, and in response to determining that the first testing file does not pass the first simulation against the design, the base pattern file is parsed to create a second testing file in the third file format. The second testing file is simulated in a second simulation. Whether the second testing file passed the second simulation is determined, and, in response to determining that the second testing file passed the second simulation, a likely non-equivalence of the derivative pattern file and the base pattern file is indicated. In response to determining that the second testing file did not pass the second simulation, a likely equivalence of the derivative pattern file and the base pattern file is indicated.
Owner:IBM CORP
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