The invention provides
atomic layer deposition equipment and a
processing method, and the
atomic layer deposition equipment comprises a jig, the side wall of which is provided with a clamping projection; the
processing mechanism comprises a shell and a box body, a sealing frame is arranged at an opening of the shell, and the box body is placed in the shell; the sealing mechanism comprises a
moving frame, a cavity door and fork teeth, the cavity door and the box body synchronously move along with the
moving frame, the fork teeth are connected to the
moving frame, penetrate through the cavity door and then extend towards the
machining cavity in the first direction, clamping blocks are arranged on the fork teeth, clamping grooves are formed in the clamping blocks, and the clamping protrusions can be embedded in the clamping grooves. Elements in the jig can be machined through the box body at the same time, the cavity door in the sealing mechanism is used for sealing and covering the
machining cavity, the prongs can move synchronously with the cavity door and can be highly matched with the jig, and therefore compared with conventional atom deposition equipment at the present stage, the
machining efficiency is greatly improved. The device has the remarkable advantages of being high in
automation degree, flexible to use, convenient to control and adjust, high in
structure matching degree, capable of remarkably improving the machining efficiency and the like.