2results about How to "Avoid recoil" patented technology

The application provides a photoresist trimming method and a semiconductor structure forming method. The photoresist trimming method comprises the following steps: after a photoresist layer is spin-coated on a wafer surface, the photoresist layer at the edge of the wafer is exposed, and the exposed area is 0-0.1 mm inward from the outermost edge of the wafer. The technical scheme can reduce the contamination particles in the process of manufacturing the semiconductor structure, and improve the process yield of manufacturing the semiconductor structure.

The utility model provides a kind of medium pressure type rotary valve, including valve body and impeller assembly, impeller assembly includes impeller blade and impeller shaft, impeller shaft rotates and is set through valve body, impeller blade is fixed on impeller shaft and is located in valve body, at least one set of annular gas path mechanism is equipped on valve body;Each set of annular gas path mechanism includes air inlet, gas outlet and gas pipe, gas pipe is set at valve body periphery, and one end is connected with air inlet, the other end is connected with gas outlet.The utility model structure design is reasonable, by the gas pipe of the two sides of valve body being communicated being designed on valve body, and gas pipe can be supplemented with gas, ensure that airflow, material can be smoothly moved in gas pipe, to effectively adjust the pressure in rotary valve, so that the internal pressure of valve body can effectively flow, avoid upward recoil, effectively guarantee the reliability and continuity of conveying, guarantee material conveying efficiency.