The invention relates to a mask and a fabrication method thereof. The mask comprises a substrate, a sacrificial layer and a mask pattern layer, wherein the substrate comprises a first surface and a second surface, the second surface deviates from the first surface, a plurality of openings are formed in the substrate and penetrate through the substrate, the substrate can be used for patterning by asemiconductor etching process, the sacrificial layer is arranged on the first surface, a plurality of holes are formed in the sacrificial layer, the mask pattern layer is arranged on the sacrificiallayer and comprises pattern regions and shielding regions which are adjacent to each other, at least one through hole is formed in the pattern regions and penetrates through the mask pattern layer, the pattern regions are exposed out of the openings and holes, each pattern region is corresponding to the openings and holes, the mask pattern layer is provided with an annular bulge extending to the openings, and the annular bulge is in contact with side walls of the openings. The mask is made by the semiconductor process, the quality of the mask and the through hole accuracy can be improved by the semiconductor process, the through hole size and the thickness of the mark pattern layer are favorably reduced, displacement of the mask pattern layer and the substrate also can be prevented, and the quality and the accuracy of the mask are higher.