A processing method of barium-strontium titanate and bismuth zinc niotate composite films is characterized by 1, preparing a photoresist mask graphic on the surface of a BST+BZN composite film sample, 2, preparing etching: A is water solution prepared by nitricacid (HNO3), hydrofluoric acid (HF) and citrate (CA), and B is water prepared by hydrochloric acid (HC1) and hydrofluoric acid (HF), 3, sequentially etching the BST+BZN composite film sample in etching solutions A,B, and determining etching time according to respective thicknesses of BST and BZN, 4, removing a photoresist mask by aid of acetone/alcohol, and preparing the photoresist mask again, 5, performing low-power ultrasonic processing on the BST+BZN composite film sample in the etching A, and 6, utilizing the acetone/alcohol to remove the photoresist mask, cleaning the sample, and drying the sample by nitrogen (N2). Surfaces of positions etched by the processing method do not have residue, and then the processing method is complete in etching and high in graphic transforming precision.