The invention provides a method for preparing a film metal micro device on the surface of PDMS by chemical plating. The method comprises: a layer of polyacrylic acid (PAA) is selectively grafted to be formed on a designated area of the surface of PDMS through the photochemical reaction by adopting photolithographic masks; after a series of surface chemical reactions such as amination, absorption, reduction and the like, a nano-scale gold particle catalytic center required by chemical plating is formed in an area irradiated by UV light; finally, by selectively carrying out chemical plating on metal by means of nano-gold catalysis, the metal film device is formed on the surface of the PDMS irradiated by the UV light. By the method, the integrated metal film is prepared on the surface of the PDMS sheet and on the inner surface of the channel / cavity of the PDMS in order to prepare such micro devices as a micro-heater, a microelectrode, a microsensor, a micro shielding device and the like, which take the PDMS as a substrate, and to integrate circuits. The method is characterized in that the process is simple and easy to practice and clean laboratories and high-cost metal evaporation and deposition processes are unnecessary. The prepared metal device has the advantages of high accuracy and low cost.