The invention provides a single granule layer nanometer diamond film with strong Si-V luminescence, and a production method thereof. The method comprises the following steps: producing a single granule layer nanometer diamond film with the thickness of 500-700nm on a monocrystalline silicon substrate by adopting a hot filament chemical vapor deposition technology; and carrying out heat insulation on the film in 600DEG C air for 10-50min to produce the single granule layer nanometer diamond film with strong Si-V luminescence. The nanometer diamond film obtained in the invention has single granule layer characteristics and has a thickness of 500-700nm, the speak shape of the Si-V luminescence peak of the film is sharp, the Si-V luminescence intensity is greatly improved, and the preparation is of great scientific and engineering significance to realize application of the film in fields of single photon sources, quantum information processing, photoelectron devices, biological markers, semiconductor devices and field emission displays.