121results about How to "Increase effective width" patented technology

Disclosed is an SRAM cell on an SOI, bulk or HOT wafer with two pass-gate n-FETs, two pull-up p-FETs and two pull-down n-FETs and the associated methods of making the SRAM cell. The pass-gate FETs and pull-down FETs are non-planar fully depleted finFETs or trigate FETs. The pull-down FETs comprise non-planar partially depleted three-gated FETs having a greater channel width and a greater gate length and, thus, a greater drive current relative to the pass-gate and pull-up FETs. Additionally, for optimal electron mobility and hole mobility, respectively, the channels of the n-FETs and p-FETs can comprise semiconductors with different crystalline orientations.

A method of manufacturing a semiconductor device having shallow trench isolation includes steps of forming a hard mask layer on the substrate surface, etching a trench through the hard mask, filling the trench with an isolation material, forming a recessed trench, and forming a serpentine gate structure to connect electronic sources and drains.

A fixing device includes a fixing roller, a fixing belt which is made to rotate by a rotation force received from the fixing roller, a nip forming unit to form a nip zone at a contact area between the fixing roller and the fixing belt, and a first heating unit, which is separated from the nip zone, to apply heat to the fixing belt. The nip zone and the heating unit are separated, so that the heating unit can be prevented from being broken as a result of the pressurization and thermal deformation.

An embodiment of the present invention provides a capacitor, comprising a solid electrode, an electrode broken into subsections with a signal bus lines connecting the subsections; and wherein the signal bus further connects the solid electrode with the electrode broken into subsections.

The present invention provides a monolithic inductor developed using radio frequency micro electromechanical (RF MEMS) techniques. In a particular embodiment of the present invention, a tunable radio frequency microelectromechanical inductor includes a coplanar waveguide and a direct current actuatable contact switch positioned to vary the effective width of a narrow inductive section of the center conductor of the CPW line upon actuation the DC contact switch. In a specific embodiment of the present invention, the direct current actuatable contact switch is a diamond air-bridge integrated on an alumina substrate to realize an RF switch in the CPW and microstrip topology.

A vertically integrated transistor device increases the effective active area of the device to improve the performance characteristics of the device. The transistor device may include a plurality of gate elements, a plurality of source-drain elements extending parallel to the plurality of gate elements and horizontally spaced therefrom; and a plurality of fin elements extending parallel to the plurality of gate elements and vertically spaced therefrom, wherein each of the plurality of fin elements is horizontally spaced a first distance from each of the other ones of the plurality of fin elements.

The invention discloses an MOS transistor with stacked nanometer lines and a manufacturing method of the MOS transistor. The MOS transistor comprises toruliform nanometer line stacks, a plurality of grid stacks, a plurality of source and drain regions and a plurality of channel regions, wherein each nanometer line stack is formed by stacking the nanometer lines in the longitudinal direction and extends on a substrate in the first direction; the grid stacks extend in the second direction and cross over the nanometer stacks; the source and drain regions are located on the two sides of each grid stack in the second direction; the channel regions are formed by the nanometer line stacks between the source and drain regions. According to the MOS transistor with the stacked nanometer lines and the manufacturing method of the MOS transistor, the toruliform nanometer line stacks with good quality are formed by means of etching carried out many times and sideward etching and filling of grooves, effective widths of conducting channels are increased at low cost, the total area of effective conductive sections is increased and drive currents are increased.

A SIMD processor efficiently utilizes its hardware resources to achieve higher data processing throughput. The effective width of a SIMD processor is extended by clocking the instruction processing side of the SIMD processor at a fraction of the rate of the data processing side and by providing multiple execution pipelines, each with multiple data paths. As a result, higher data processing throughput is achieved while an instruction is fetched and issued once per clock. This configuration also allows a large group of threads to be clustered and executed together through the SIMD processor so that greater memory efficiency can be achieved for certain types of operations like texture memory accesses performed in connection with graphics processing.

The invention provides an arc coating apparatus having a steering magnetic field source comprising steering conductors disposed along the short sides of a rectangular target behind the target, and a magnetic focusing system disposed along the long sides of the target in front of the target which confines the flow of plasma between magnetic fields generated on opposite long sides of the target. The plasma focusing system can be used to deflect the plasma flow off of the working axis of the cathode. Each steering conductor can be controlled independently. In a further embodiment, electrically independent steering conductors are disposed along opposite long sides of the cathode plate, and by selectively varying a current through one conductor, the path of the arc spot shifts to widen an erosion corridor. The invention also provides a plurality of internal anodes, and optionally a surrounding anode for deflecting the plasma flow and preserving a high ionization level of the plasma. The invention also provides a shield at floating potential, restricting the cathode spot from migrating into selected regions of the target evaporation surface outside of the desired erosion zone. The shield may be positioned immediately above the region of the target surface in the vicinity of the anode, protecting the anode from deposition of cathodic evaporate and providing better distribution of cathodic evaporate over the substrates to be coated. The invention further provides correcting magnets adjacent to the short sides of the target, to move the arc spot between the long sides.

An outer box for a bag in box packaging includes a plurality of walls and an articulatable portion. The articulatable portion is hingedly coupled to each of the dispensing wall, the first sidewall and the second sidewall. The articulatable portion also includes a front portion, a first side webbing and a second side webbing. Inward rotation of the front portion causes the first and second panels of each of the first and second side webbing to rotate about a respective one of the central folds thereof. An outer surface of each of the first and second panels face each other, with the articulated portion overlying a portion of the first panel of each of the first side webbing and second side webbing.

A static memory cell and a forming method thereof are provided; the static memory cell comprises the following elements: a semiconductor substrate comprising a first zone forming a pull down transistor and a second zone forming a pull up transistor; a first pin portion positioned on a surface of the semiconductor substrate in the first zone and a second fin portion positioned on a surface of the semiconductor in the second zone, wherein a top of the second fin portion is provided with an insulation layer; an interlayer medium layer covering the semiconductor substrate surface besides the first fin portion and the second fin portion, and a surface of the interlayer medium layer is lower than a top surface of the first and second fin portions; a first grid electrode structure positioned on the surface of the interlayer medium layer and capable of crossing the top and a side wall of the single first fin portion, and a second grid electrode structure positioned on the surface of the interlayer medium layer and capable of crossing a top and a side wall of the single second fin portion, and the second grid electrode structure is isolated from the top portion of the second fin portion through an insulation layer. The static memory cell is stable in performance, and a finally formed SRAM memory is excellent in performance.

A stacked nanowire MOS transistor and a manufacturing method therefor. The stacked nanowire MOS transistor comprises multiple nanowire stacks, multiple gate stacks, multiple source and drain regions, and multiple channel regions. The nanowire stacks extend along a first direction (Y-Y') on a substrate (1). The gate stacks extend along a second direction (X-X') and cross each nanowire stack. The source and drain regions are located on two sides of each gate stack along the second direction (X-X'). The channel regions are formed by the nanowire stacks among the multiple source and drain regions. The multiple nanowire stacks are stacks formed by multiple cascaded nanowires. By performing etch-backs, performing side etching on the channels and performing filling many times, cascaded nanometer stacks with good quality are formed and the effective width of electric conduction channels are fully increased by using low cost, and the total electric conduction area is improved, thereby improving a driving current.

An image heating apparatus includes a pressure roller, a belting film to circulate while partially connecting with the pressure roller, a support member to be provided in the belting film and comprises a guide to guide the circulating of the belting film, a nip spring to comprise a nip portion to form a nip between the belting film and the pressure roller, and a support portion to support the nip portion against the support member, and a heater to be provided adjacent to the nip spring and transfer heat to the image through the belting film.

The present invention discloses a structural light-based airport runway foreign body detection system. The system includes a detection vehicle as well as a line laser module, an image acquisition module and a computer control and processing module which are all mounted on the detection vehicle; the line laser module is mounted at the rear end of the detection vehicle and projects a structural light plane to the surface of a runway with a certain attitude so that the structural light plane can form a structural light strip; the image acquisition module is located at the rear end of the test vehicle and is located at the same plane with the line laser module, wherein the plane is perpendicular to the surface of the runway; the image acquisition module acquires the light strip image of the surface of the runway with a certain attitude and transmits light strip image data to a computer; and the computer control and processing module is located inside the detection vehicle, controls the image acquisition module to acquire the light strip image of the surface of the runway, and processes the light strip image data in real time through related software and judges whether a foreign body exists on the runway.

A portable electronic device is provided that includes an optical display, a display controller for presenting display data to the optical display in order to display the display data; and an accelerometer operatively coupled to the display controller. The display controller presents the display data to the optical display as a function of motion of the portable electronic device as sensed by the accelerometer.

The invention relates to the technical field of remelting, in particular to a remelting device and method. The remelting device comprises a workpiece bearing device, a remelting structure provided with a remelting piece, and a remelting piece adjustment device provided with a first adjustment device. The remelting piece adjustment device can control and achieve feeding of the remelting piece in the central axis direction of a workpiece and can further adjust the effective widths of remelting layers. The overlap amount is increased and/or the consistency of the overlap amount is improved by increasing the effective widths of all the single-pass remelting layers and/or enabling the effective widths of the different single-pass remelting layers to be kept consistent, all overlap regions are more fully melted, the risks that cracks and/or weak regions appear on the workpiece are reduced, the performance such as the mechanical strength and the fatigue strength of the workpiece can be enhanced, the working reliability of the workpiece is improved, and the service life of the workpiece is prolonged.