2results about How to "Reduce thickness fluctuation" patented technology

The utility model relates to the technical field of semiconductor material preparation, and disclose a kind of N type high-purity silicon target material red phosphorus doping device, including reaction chamber, rotating support mechanism, phosphorus vapor injection system, partition temperature control module, gas circulation unit and intelligent control system, reaction chamber adopts quartz material double-layer structure, the inner wall of reaction chamber is provided with silicon nitride coating, the outer wall of reaction chamber is provided with vacuum pump set, rotating support mechanism includes high-temperature ceramic support, magnetic fluid seal shaft and brushless motor, high-temperature ceramic support is connected with the output end of brushless motor by magnetic fluid seal shaft, by integrated reaction chamber, rotating support mechanism, phosphorus vapor injection system, partition temperature control module, gas circulation unit and intelligent control system, by rotating dynamic doping, intelligent temperature control and waste gas circulation technology, significantly improve the uniformity of doping and raw material utilization rate, realize the efficient, uniform doping of silicon target material.

This application relates to the field of production control technology, and particularly to a method and apparatus for adjusting the thickness uniformity of BOPP film castings. The method includes: acquiring production status parameters, production setting parameters, and rotation angle information; determining thickness fluctuation characteristics based on the production status parameters and production setting parameters; wherein the thickness fluctuation characteristics reflect the degree of difference between the actual thickness and the target thickness of the film during film production; and determining an adjustment strategy based on the thickness fluctuation characteristics, rotation angle information, and production status parameters; wherein the adjustment strategy includes a first strategy of adjusting the initial rotation speed setting parameter of the quench roller during film production and a second strategy of adjusting the initial air pressure setting parameter of the air knife during film production. The BOPP film casting thickness uniformity adjustment method provided by this application can improve the thickness uniformity of the film during film production.