The present application discloses a raw material composition for preparing a photocurable resin, a photocurable resin prepared therefrom and use thereof, belonging to the field of curable resin synthesis. The raw material composition for preparing the photocurable resin comprises cyanate ester, photocurable prepolymer, diluent, catalyst and photoinitiator. The photocurable interpenetrating polymer network structure resin is obtained from the composition through ultraviolet light curing and thermal curing. The raw material composition for preparing the photocurable resin of the present application has both the characteristics of rapid prototyping of photosensitive resin and the characteristics of excellent heat resistance and moisture resistance of cyanate ester. The photocurable interpenetrating polymer network structure resin of the present application has low viscosity and is easy to process, and has the advantages of high strength, high temperature resistance, low shrinkage, low water absorption and low dielectric constant, etc., and can be used for 3D printing, coating, bonding, etc. Agents, aerospace materials, printed circuit boards, invisibility cloaks, artificial satellites, flame retardant materials and electronic packaging.