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41results about How to "Image distortion is small" patented technology

High-image-quality and low-distortion machine vision ultraviolet lens

The invention relates to a high-image-quality and low-distortion machine vision ultraviolet lens. The high-image-quality and low-distortion machine vision ultraviolet lens mainly comprises a front lens group, a rear lens group and a diaphragm, wherein each of the front lens group and the rear lens group has positive focal power; the diaphragm is positioned between the front lens group and the rear lens group; the front lens group is sequentially provided with a first lens, a second lens, a third lens and a fourth lens from an object space to an image space; the first lens, the second lens, the third lens and the fourth lens form a bonding lens; each of the first lens, the second lens and the third lens has negative focal power, and the four lens has the positive focal power; the rear lens group is sequentially provided with a fifth lens, a sixth lens, a seventh lens and an eighth lens from the object space to the image space; each of the fifth lens and the sixth lens has the positive focal power, and each of the seventh lens and the eighth lens has the negative focal power. With the eight spherical lenses, the high-image-quality and low-distortion machine vision ultraviolet lens has the characteristics of small F number, compact structure, low distortion, high resolution and the like, and is quite suitable for being integrated to a machine vision system.
Owner:AZURE PHOTONICS

Off-axis total reflection optical system with huge field of view

ActiveCN102087407ABig contribution to balanceReduce driftTelescopesSpace opticsOptical power
The invention relates to an off-axis total reflection optical system with huge field of view, belongs to the technical field of space optics, and is used for solving the problems of the existing total reflection optical system, such as small imaging field angle and low imaging distortion. The off-axis total reflection optical system is characterized in that an aperture diaphragm is superposed to a second reflector; the system comprises a spherical reflector of which focal power the a first reflector and a third reflector is negative, the second reflector and a fourth reflector are spherical reflectors with positive optical power; the reflection surface of the first reflector is opposite to the reflection surface of the second reflector; the reflection surface of the second reflector is opposite to the reflection surface of the third reflector; the reflection surface of the third reflector is opposite to the reflection surface of the fourth reflector; and the fourth reflector is opposite to the image surface of a detector. A camera using the optical system has a huge field of view, small distortion, no shades, small stray light coefficient and high transmission function, and can also achieve multi-spectral imaging. The off-axis total reflection optical system with huge field of view is applicable to photoelectric imaging of the aeronautic and astronautic field.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Phased array overall situation focusing system and focusing method thereof

The invention discloses a phased array overall situation focusing system and a focusing method thereof. The phased array overall situation focusing system can transmit on a single energy converter unit by turns and all the energy converter units receive and focus transmission and receiving synthesis on echo line scanning signals of a plurality of sampling points of a space, so that the space imaging quality can be greatly improved. The phased array overall situation focusing system comprises an energy converter unit, a signal processing unit, a dynamic delay overall situation focusing compensation module and a signal overlapping module; the phased array overall situation focusing system can be used for transmitting the phased array and focusing the transmission and receiving synthesis on any one space point on a synthesis line behind a space initial focusing point; in an ultrasonic phased array control nondestructive testing application, the echo line scanning signals reflected by a pre-set sampling point with small imaging distortion and high image quality can be obtained; all depth focusing compensation requirements can also be met under refraction conditions. A traditional phased array technology can also be improved and distortion caused by the fact that defect depths are not in focusing depths is reduced; the total graph focusing effect of imaging an object to be detected can be realized.
Owner:SHENZHEN UNIV

High-resolution high-value hole diameter imaging spectrometer for plant weak fluorescence passive detection

The invention discloses a high-resolution high-value hole diameter imaging spectrometer for plant weak fluorescence passive detection. The imaging spectrometer is sequentially provided with a slit, afirst lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a plane transmission grating, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, a thirteenth lens and an image surface, wherein the first to sixth lenses form a collimation lens group; the eighth to thirteenth lenses form a focusing lens group. The hole diameter grating is positioned onthe plane lens grating; the collimation lens group projects slit emergent light onto the plane transmission grating; the plane transmission grating performs chromatic dispersion on the collimation light; a continuous chromatic dispersion spectrum is formed through the focusing lens group and is imaged on the image surface. The optical system has high value hole diameter and high resolution; the forming elements are simple; the processing and the manufacturing are easy; the assembly is easy; the imaging quality is excellent; the whole view field whole wave band mean square root point range figure is realized; the radius value is smaller than 6.5 mum; the imaging aberration is lower than 0.5 percent.
Owner:HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI

Large-field-of-view small-F-number ultrahigh-resolution ultraviolet spectral imager

The invention relates to a large-field-of-view small-F-number ultrahigh-resolution ultraviolet spectral imager and belongs to the technical field of imaging. The large-field-of-view small-F-number ultrahigh-resolution ultraviolet spectral imager is sequentially provided with a first crescent lens, a second crescent lens, a first biconcave lens, an aperture diaphragm, a first biconvex lens, a second biconvex lens, a biconcave lens, a third biconvex lens and a third crescent lens, wherein all lenses are disposed on the same optical axis; the first crescent lens, the second crescent lens and the first biconcave lens form a front lens group to realize primary imaging, and a convergence surface is located on the aperture diaphragm; the first biconvex lens, the second biconvex lens, the second biconcave lens, the third biconvex lens and the third crescent lens form a rear lens group to perform secondary imaging to a converged ray surface of the aperture diaphragm, and an image is located on an image surface. The large-field-of-view small-F-number ultrahigh-resolution ultraviolet spectral imager has the advantages that the components are simple and easy to manufacture, the system is small in size, the tolerance is good, the assembling is facilitated, the imaging quality is excellent, the all-field-of-view full-waveband modulation transfer function value at Nyquist frequency of 1001p / mm is superior to 0.48, and the imaging distortion is lower than 0.5 percent.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Phased Array Global Focusing System and Its Focusing Method

The invention discloses a phased array overall situation focusing system and a focusing method thereof. The phased array overall situation focusing system can transmit on a single energy converter unit by turns and all the energy converter units receive and focus transmission and receiving synthesis on echo line scanning signals of a plurality of sampling points of a space, so that the space imaging quality can be greatly improved. The phased array overall situation focusing system comprises an energy converter unit, a signal processing unit, a dynamic delay overall situation focusing compensation module and a signal overlapping module; the phased array overall situation focusing system can be used for transmitting the phased array and focusing the transmission and receiving synthesis on any one space point on a synthesis line behind a space initial focusing point; in an ultrasonic phased array control nondestructive testing application, the echo line scanning signals reflected by a pre-set sampling point with small imaging distortion and high image quality can be obtained; all depth focusing compensation requirements can also be met under refraction conditions. A traditional phased array technology can also be improved and distortion caused by the fact that defect depths are not in focusing depths is reduced; the total graph focusing effect of imaging an object to be detected can be realized.
Owner:SHENZHEN UNIV

A high-quality, low-distortion machine vision ultraviolet lens

The invention relates to a high-image-quality and low-distortion machine vision ultraviolet lens. The high-image-quality and low-distortion machine vision ultraviolet lens mainly comprises a front lens group, a rear lens group and a diaphragm, wherein each of the front lens group and the rear lens group has positive focal power; the diaphragm is positioned between the front lens group and the rear lens group; the front lens group is sequentially provided with a first lens, a second lens, a third lens and a fourth lens from an object space to an image space; the first lens, the second lens, the third lens and the fourth lens form a bonding lens; each of the first lens, the second lens and the third lens has negative focal power, and the four lens has the positive focal power; the rear lens group is sequentially provided with a fifth lens, a sixth lens, a seventh lens and an eighth lens from the object space to the image space; each of the fifth lens and the sixth lens has the positive focal power, and each of the seventh lens and the eighth lens has the negative focal power. With the eight spherical lenses, the high-image-quality and low-distortion machine vision ultraviolet lens has the characteristics of small F number, compact structure, low distortion, high resolution and the like, and is quite suitable for being integrated to a machine vision system.
Owner:AZURE PHOTONICS

In-situ dimensional measurement method and device for parts

InactiveCN109506571AImaging distortion is smallQuality improvementUsing optical meansImage sensorImage acquisition
An in-situ dimensional measurement method and device for parts are provided. The device herein comprises a mechanical portion, an optical imaging portion, an image acquisition portion and an image processing portion; the mechanical portion is composed of a pair of reflector carriers, a pair of isolators, a pitching and yawing adjustment platform, a vertical shift platform, a support post, and a device housing. The optical imaging portion is composed of a pair of reflectors, a pair of filters, a telecentric lens and a telecentric light source. The image acquisition portion is composed of an image sensor, a trigger controller, a trigger button, a battery and a USB (universal serial bus) interface. The image processing portion is composed of a computer and image processing software. The method herein is based on machine vision provides in-situ dimensional measurement for small parts; removing a part under measurement from a work station is not required during measuring; the part under measurement is irradiated with the telecentric source; the image sensor acquires an image that is processed by the image processing software; dimensional information of the part can be calculated. The device and method herein have the advantages of zero contact, high efficiency, high precision, automated measurement and the like.
Owner:BEIJING INST OF AEROSPACE CONTROL DEVICES

Freeform Surface Imaging Optical System

InactiveCN103592749BReasonable spacing designReduced band driftRadiation pyrometrySpectrometry/spectrophotometry/monochromatorsFree formAstronautics
The invention discloses a free-form surface imaging optical system. The free-form surface imaging optical system comprises a first reflector, a second reflector, a third reflector, a fourth reflector, an aperture diaphragm and a detector. A target is irradiated on the second reflector after being reflected by the first reflector, is irradiated on the third reflector after being reflected by the second reflector, is irradiated on the fourth reflector after being reflected by the third reflector, and finally is irradiated on the image plane of the detector after being reflected by the fourth reflector. The aperture diaphragm coincides with the third reflector in position. The first reflector is a long-strip-shaped spherical reflector of which the focal power is negative. The second reflector is a free-form surface reflector of which the focal power is positive. The third reflector is a free-form surface reflector of which the focal power is negative. The fourth reflector is a free-form surface reflector of which the focal power is positive. A camera with the free-form surface imaging optical system adopted is huge in view field and small in distortion, and can achieve multi-spectrum imaging. The free-form surface imaging optical system can be applied to the field of aeronautics and astronautics photo-electronic imaging.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI

Laser scanning microscopic measurement device and method thereof

The invention relates to a laser scanning microscopic measurement device and method. A semi-reflecting and semi-transmitting mirror is arranged on an output light path of a laser, a galvanometer and a scanning objective lens are sequentially arranged on a reflection light path of the semi-reflecting and semi-transmitting mirror, and a detection module is arranged on a transmission light path; the laser emits laser, the laser enters the galvanometer through the semi-reflecting and semi-transmitting mirror, the galvanometer controls the laser to perform two-dimensional deflection, the laser is focused on a sample on the three-dimensional displacement table after passing through the scanning objective lens, and the laser is reflected after entering the sample, returns to the scanning objective lens and the galvanometer and then enters the detection module after passing through the semi-reflecting and semi-transmitting mirror; the detection module obtains images under different X-Y-Z coordinates, takes one or more CCD elements as virtual pinholes, obtains light intensity of a virtual pinhole area with the maximum light intensity in each image, obtains light intensity values under different X-Y-Z coordinates, obtains a Z coordinate corresponding to the maximum light intensity under any X-Y coordinate, that is, depth distribution of an X-Y plane, and measures surface appearance information of scratches and roughness.
Owner:SUZHOU DELPHI LASER +1

Photoetching image obtaining method capable of improving imaging quality

The invention discloses a photoetching image obtaining method capable of improving imaging quality and belongs to the technical field of semiconductor silicon wafer photoetching. The method comprises the following steps: according to a relationship between internal and external coherence factors sigma and sigma<out> of annular illumination and imaging distortion, determining sigma and sigma<out> capable of enabling the imaging distortion to be minimum by using a particle swarm algorithm, and reducing the imaging distortion of a photoetching image; enabling the initial binary mask pattern to pass through a photoetching imaging model to obtain a space image, determining a light intensity contrast gamma according to the light intensity distribution of the space image, delimiting parts with relatively high light intensity and relatively low light intensity, modifying the initial binary mask pattern, and reducing imaging fracture in a photoetching image; and finally, optimizing the modified initial binary mask pattern by using a gradient algorithm to obtain a real-value mask pattern, converting the real-value mask pattern into a binary mask pattern, and performing photoetching imaging by taking the binary mask pattern as a final initial binary mask pattern to obtain a final photoetching image, so the imaging distortion and imaging fracture are further reduced at the same time.
Owner:CHANGCHUN UNIV OF SCI & TECH

A High Resolution, High Numerical Aperture Imaging Spectrometer for Passive Detection of Faint Fluorescence in Vegetation

The invention discloses a high-resolution high-value hole diameter imaging spectrometer for plant weak fluorescence passive detection. The imaging spectrometer is sequentially provided with a slit, afirst lens, a second lens, a third lens, a fourth lens, a fifth lens, a sixth lens, a plane transmission grating, an eighth lens, a ninth lens, a tenth lens, an eleventh lens, a twelfth lens, a thirteenth lens and an image surface, wherein the first to sixth lenses form a collimation lens group; the eighth to thirteenth lenses form a focusing lens group. The hole diameter grating is positioned onthe plane lens grating; the collimation lens group projects slit emergent light onto the plane transmission grating; the plane transmission grating performs chromatic dispersion on the collimation light; a continuous chromatic dispersion spectrum is formed through the focusing lens group and is imaged on the image surface. The optical system has high value hole diameter and high resolution; the forming elements are simple; the processing and the manufacturing are easy; the assembly is easy; the imaging quality is excellent; the whole view field whole wave band mean square root point range figure is realized; the radius value is smaller than 6.5 mum; the imaging aberration is lower than 0.5 percent.
Owner:HEFEI INSTITUTES OF PHYSICAL SCIENCE - CHINESE ACAD OF SCI

Off-axis total reflection optical system with huge field of view

ActiveCN102087407BBig contribution to balanceReduce driftTelescopesSpace opticsOptical power
The invention relates to an off-axis total reflection optical system with huge field of view, belongs to the technical field of space optics, and is used for solving the problems of the existing total reflection optical system, such as small imaging field angle and low imaging distortion. The off-axis total reflection optical system is characterized in that an aperture diaphragm is superposed to a second reflector; the system comprises a spherical reflector of which focal power the a first reflector and a third reflector is negative, the second reflector and a fourth reflector are spherical reflectors with positive optical power; the reflection surface of the first reflector is opposite to the reflection surface of the second reflector; the reflection surface of the second reflector is opposite to the reflection surface of the third reflector; the reflection surface of the third reflector is opposite to the reflection surface of the fourth reflector; and the fourth reflector is opposite to the image surface of a detector. A camera using the optical system has a huge field of view, small distortion, no shades, small stray light coefficient and high transmission function, and can also achieve multi-spectral imaging. The off-axis total reflection optical system with huge field of view is applicable to photoelectric imaging of the aeronautic and astronautic field.
Owner:CHANGCHUN INST OF OPTICS FINE MECHANICS & PHYSICS CHINESE ACAD OF SCI
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