The invention discloses a projection objective lens and an exposure system. The projection objective lens comprises a first lens group with positive focal power, a second lens group with negative focal power, a third lens group with positive focal power, an aperture diaphragm, a fourth lens group with positive focal power, a fifth lens group with negative focal power and a sixth lens group with positive focal power which are sequentially arranged from object plane along optical axis, wherein the first lens group and the sixth lens group are symmetrical based on the aperture diaphragm, the second lens group and the fifth lens group are symmetrical based on the aperture diaphragm, the third lens group and the fourth lens group are symmetrical based on the aperture diaphragm, and the following relational expressions are satisfied that f1 / f2 is more than -0.7 and less than -0.3, f2 / f3 is more than -1.1 and less than -0.6, f5 / f4 is more than -1.1 and less than -0.6, f6 / f5 is more than -0.7and less than -0.3, wherein f1, f2, f3, f4, f5, and f6 are the focal lengths of the first lens group, the second lens group, the third lens group, the fourth lens group, the fifth lens group, and thesixth lens group respectively. According to the technical scheme provided by the embodiment of the invention, the compatibility of the projection objective lens is improved, and the modularization level of an exposure system is improved.