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33 results about "Concentrations plasma" patented technology

Controlled release oxycodone compositions

A method for substantially reducing the range in daily dosages required to control pain in approximately 90% of patients is disclosed whereby an oral solid controlled release dosage formulation having from about 10 to about 40 mg of oxycodone or a salt thereof is administered to a patient. The formulation provides a mean maximum plasma concentration of oxycodone from about 6 to about 60 ng / ml from a mean of about 2 to about 4.5 hours after administration, and a mean minimum plasma concentration from about 3 to about 30 ng / ml from about 10 to about 14 hours after repeated “q12h” (i.e., every 12 hour) administration through steady-state conditions. Another embodiment is directed to a method for substantially reducing the range in daily dosages required to control pain in substantially all patients by administering an oral solid controlled release dosage formulation comprising up to about 160 mg of oxycodone or a salt thereof, such that a mean maximum plasma concentration of oxycodone up to about 240 ng / ml from a mean of up to about 2 to about 4.5 hours after administration, and a mean minimum plasma concentration up to about 120 ng / ml from about 10 to about 14 hours after repeated “q12h” (i.e., every 12 hour) administration through steady-state conditions are achieved. Controlled release oxycodone formulations for achieving the above are also disclosed.
Owner:PURDUE PHARMA LP +1

Large-air-volume low-concentration plasma exhaust gas treatment device

The invention discloses a large-air-volume low-concentration plasma exhaust gas treatment device comprising a plasma shell, wherein an air inlet and an air outlet are arranged on the plasma shell; a plurality of plasma generators are arranged in at least one cross section of the cavity of the plasma shell; the plasma generators in the same cross section are connected with each other; the plasma generators are vertical to the air inlet and comprise insulating bases; air flow uniform grids are connected at the front and rear parts of the bases; a plurality layers of wire electrodes and a plurality of plate electrodes are vertically connected between the left and right plates in the cavities of the bases from top to bottom; the plate electrodes as well as the plate electrodes and the layers of wire electrodes are parallel to each other; each plate electrode is in interleave arrangement with each layer of wire electrodes and has equal space with adjacent wire electrodes; each layer of wire electrodes are uniformly arranged at intervals; each plate electrode and wire electrode are respectively connected with an outgoing wire; and the outgoing wires are respectively connected with the ground terminal and the high voltage terminal of a high voltage alternating current power supply. The large-air-volume low-concentration plasma exhaust gas treatment device disclosed by the invention is capable of obtaining relatively high gas treatment flow, maintaining high-density large-area plasma, discharging in a stable state and improving the treatment efficiency.
Owner:中维环保科技有限公司
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