A new technique is presented for improving the
microfabrication yield of Josephson junctions in
superconducting integrated circuits. This is based on the use of a double-layer lithographic
mask for partial anodization of the side-walls and base
electrode of the junctions. The top layer of the
mask is a
resist material, and the bottom layer is a
dielectric material chosen so as to a) maximize adhesion between the
resist and the underlying superconducting layer, b) be etch-compatible with the underlying superconducting layer, and c) be insoluble in the
resist and anodization
processing chemistries. In a preferred embodiment of the invention, the superconductor is
niobium, the material on top of this is
silicon dioxide, and the top layer is conventional
photoresist or
electron-beam resist. The use of this combination results in a substantial increase in the fabrication yield of high-density
superconducting integrated circuits due to increase in junction uniformity and reduction in defect density. An additional improvement over the prior art involves the replacement of a wet-etch step with a dry etch more compatible with microlithography.