9results about How to "Reduce non-uniformity" patented technology

The present invention belongs to the field of infrared information acquisition and image processing technology, and discloses an infrared line array camera point target search system, control method and application. The output end of a one-dimensional parallel search and clutter suppression device is connected to a morphological operation device, and the output end of the morphological operation device is connected to a point target detection device; the one-dimensional parallel search and clutter suppression device is provided with an imaging data distributor, a parallel data processor and a parameter corrector; the clutter suppression device is provided with a target expansion operator; the point target detection device is provided with a memory, an operator and a judger. Based on the imaging characteristics of the infrared line array camera, the present invention first performs a one-dimensional parallel rapid search to reduce the influence of the non-uniformity of the infrared camera, mark the potential target point, and then perform a morphological operation on the target point. Finally, according to the preset parameters, the temporal and spatial correlation between frames is used to confirm the target. The use of the present invention can significantly improve the signal-to-noise ratio of point targets in infrared remote sensing images and improve the detection rate.

The utility model discloses a metal sputtering device for manufacturing drain-source electrodes of a silicon carbide-based chip, which comprises a base, the upper surface of the base is fixedly connected with a vacuum chamber, the upper surface of the vacuum chamber is fixedly connected with a radio-frequency power supply, the upper surface of the vacuum chamber is fixedly communicated with a water-cooling sleeve, and the water-cooling sleeve is fixedly communicated with the base. The bottom surface of the water cooling sleeve is fixedly connected with a back plate, the bottom surface of the back plate is fixedly connected with a target material, the bottom surface of the vacuum chamber is fixedly connected with a driving motor, the output end of the driving motor is fixedly connected with a rotating shaft, the outer surface of the rotating shaft is fixedly connected with a bearing seat, and the upper surface of the rotating shaft is fixedly connected with a clamping device. According to the device, the thickness difference of a deposited film can be reduced and the thickness uniformity of the film can be improved by rotating the substrate, and when the magnetron sputtering gun is fixed, the metal film can be more uniformly deposited on the surface of the substrate by the rotating substrate, so that defects, inclusions and non-uniformity in the film can be reduced.

When a large-sized silicon nitride substrate having high thermal conductivity is produced, a portion where the thermal conductivity is low is generated, which causes reduction in yield (pass rate). Provided is a silicon nitride substrate in which λe / λc, which is a ratio of a thermal conductivity λc at a center portion of the substrate to a thermal conductivity λe at an end portion of the substrate, is 0.85 to 1.15. Preferably, the silicon nitride substrate has a size of 150 mm×150 mm or more. In the silicon nitride substrate, the λc and the λe each are preferably 100 W / m·K or more.

The invention discloses injection-casting high-Zn magnesium alloy based on a two-stage corrosion-resistant barrier and a preparation method of the injection-casting high-Zn magnesium alloy, and belongs to the technical field of magnesium alloy materials and metallurgy. Aiming at the corrosion resistance bottleneck caused by looseness of a surface film of the high-Zn system injection casting magnesium alloy and strong cathode activity of a second phase of a grain boundary, a new two-stage corrosion resistance barrier design thought is provided, and through main and micro element optimization design, injection casting forming process optimization and cooperative regulation and control of a precise heat treatment system, the high-Zn system injection casting magnesium alloy is obtained. And a two-stage corrosion-resistant barrier with a compact surface passivation layer and a fine net-shaped weak cathode phase is constructed. After the magnesium alloy prepared through the method is soaked in a 3.5 wt% NaCl solution for 7 days, the weight loss corrosion rate is smaller than or equal to 0.70 mm / year, the hydrogen evolution rate is smaller than or equal to 0.40 mL / cm / day, the corrosion resistance is remarkably superior to that of an existing commercial high-Zn magnesium alloy, and the magnesium alloy is suitable for the fields, with requirements for corrosion resistance and light weight, such as 3C, unmanned aerial vehicles, robots and automobiles.

The utility model provides a kind of grouting anchor rod for water conservancy and hydropower engineering foundation reinforcement construction, grouting anchor rod body 1 is overall cylindrical, the inside of grouting anchor rod body 1 is interval and provided with pressurized cheek 2, grouting pressurized rod 4 is fixedly installed in the inside of pressurized cheek 2 in penetrating mode;The inside of grouting anchor rod body 1 is interval and provided with multiple guide columns 3, the inside of grouting anchor rod body 1 is provided with a grouting pressurized rod 4, grouting pressurized rod 4 is fixedly installed in the inside of multiple guide columns 3 in penetrating mode, grouting pressurized rod 4 is also fixedly installed in the inside of pressurized cheek 2 in penetrating mode.Numerical simulation result shows that, using the grouting anchor rod of the utility model can effectively grout and fill up fine crack, and the rated pressure of hydraulic cylinder is greater than the rated grouting pressure of grouting pump, can produce certain pulse effect, reduce the non-uniformity of slurry, greatly improve the effect of grouting.

This invention provides a copper-zinc-tin-sulfur-selenium thin film, its preparation method, and a semiconductor device thereof. The preparation method includes: fully dissolving at least one metal source of copper, zinc, tin, sulfur, and selenium in a ligand solvent; then adding a main solvent, other metal sources, and a sulfur or selenium source; and thoroughly mixing to obtain a copper-zinc-tin-sulfur-selenium precursor solution based on a mixed solvent system. The ligand solvent is a small-molecule solvent with carbonyl or amine coordinating groups that provide lone pairs of electrons to metal cations. The precursor solution is then coated onto a substrate surface to prepare a precursor thin film. The precursor thin film is further subjected to post-selenization or post-sulfurization treatment to obtain the copper-zinc-tin-sulfur-selenium thin film. By introducing a small-molecule solvent with specific coordination ability to form discrete metal-ligand structural units with the metal precursor, metal clusters or oxygen bridge network structures are effectively suppressed. High homogenization of the precursor solution is achieved at the molecular scale, significantly improving the thickness and compositional uniformity of the copper-zinc-tin-sulfur-selenium precursor thin film.

The application discloses a kind of deep explainable multimodal discriminative representation method.Deep explainable multimodal discriminative representation network model is proposed in the application, the method aligns heterogeneous modal in discriminative common space to improve classification accuracy, and provides a sensitive feature analysis idea.Specifically, the application uses multilayer perceptron as an encoder, combines self-representation constraints embedded with structural information and generalized canonical correlation analysis constraints, maps multimodal data into discriminative common space, and improves recognition performance.In addition, the application decouples sensitive features by compressing complex networks through knowledge distillation to enhance the explainability of the model.

The invention discloses a TEC infrared imaging temperature control system and method based on STM32, and belongs to the technical field of video image processing. The system comprises a TEC refrigeration sheet, an environment temperature sensor and an STM32 microcontroller which are arranged in a separation blade, the environment temperature sensor is arranged on the front side of the separation blade, the separation blade is further electrically connected with a separation blade temperature sensor, and a rotating motor is arranged at the bottom of the separation blade. The temperature of the separation blade is controlled through the TEC refrigeration sheet, so that the separation blade is kept constant in the working temperature range of the infrared imaging equipment. When the environment temperature changes, the TEC refrigeration sheet adjusts the refrigeration power according to signals fed back by the environment temperature sensor and the separation blade temperature sensor, so that the stability of the temperature of the separation blade is ensured. And the imaging effect of the infrared imaging equipment in an environment with relatively large temperature change is improved.

A method of manufacturing a diffractive optical element includes determining a phase distribution of the diffractive optical element based on a scalar GS algorithm, performing first binary quantization on the phase distribution in a first interval or a second interval obtained by Fourier transform, setting the phase distribution in the first interval as a first value, and setting the phase distribution in the second interval as a second value; the phase distribution in the first interval is set as a first value, the phase distribution in the second interval is set as a second value, the range size of the first interval is different from that of the second interval, so that the vector zero order of the large-angle beam splitting dot matrix is effectively reduced under the scalar design condition, and the sum of the range size of the first interval and the range size of the second interval is 2pi; and forming the diffractive optical element with a two-step structure according to the determined phase distribution of the diffractive optical element.