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2results about How to "Adjust voltage" patented technology

Doubly-fed asynchronous power generation system and method for intelligently adjusting converter module

The invention relates to the technical field of power generation control, and discloses a doubly-fed asynchronous power generation system and method for intelligently adjusting a converter module, and the system comprises a generator set, a dynamic converter, a converter controller, and a DC excitation controller. The generator set is a doubly-fed asynchronous generator in a synchronous generator state or an asynchronous generator state and a driving prime mover of the doubly-fed asynchronous generator; the dynamic converter sets the working mode of the generator according to the rotating speed value of the generator set; the variable current controller is used for performing power generation adjustment on the generator set according to the power generation mode and determining an excitation control scheme of the generator set; and the direct current excitation controller is used for carrying out direct current excitation on the doubly-fed asynchronous generator which is in a synchronous generator state and runs in a full-power conversion mode according to the excitation control scheme. Different power generation modes are adopted according to the operation rotating speed value of the doubly-fed asynchronous generator, the excitation control scheme is generated in the power generation process according to the power generation modes, and the power generation efficiency and the operation flexibility of a unit can be improved.
Owner:GUANGZHOU SOUTH CHINA XINYU ENERGY TECH CO LTD

Substrate support unit and substrate processing apparatus including the thereof

PendingCN122091461AImprove technician precisionRegulate the generated formElectric discharge tubesPhase-change materialMechanical engineering
This invention relates to a substrate support unit and a substrate processing apparatus including the same. The object of this invention is to provide a focusing ring, a substrate support unit including the same, and a substrate processing apparatus that improves the problem of plasma sheath shape change that occurs simultaneously with focusing ring wear during substrate processing. The substrate support unit of this invention is disposed inside a cavity body of a plasma-processed substrate to hold the substrate. The substrate support unit is characterized by comprising: an electrostatic chuck for adsorbing the substrate; and a focusing ring disposed on the electrostatic chuck to surround the substrate, the focusing ring comprising a phase change material that changes phase according to temperature.
Owner:SYSTEM ENGINEERING MEGA SOLUTION CO LTD