45results about How to "Avoid backsplash" patented technology

The invention belongs to the technical field of cold-rolled emulsion spot treatment, and in particular relates to a blowing-free emulsion residue removal method, which is applied to various cold-rolling mills. The blowing-free emulsion residue removal method is characterized by comprising the following steps of: 1) blocking low inertia force return of the emulsion; 2) blocking side fluid channeling of the emulsion; 3) blocking fluid channeling of intermediate roll shifting empty emulsion; 4) blocking the condensate of the emulsion; 5) rapidly draining the injection beam of the emulsion; and 6) preventing splashing. The blowing-free emulsion residue removal method has the advantages of simpleness and excellent treatment efficiency.

The invention relates to a process cavity of a glue evening unit, and specifically relates to an anti-splash and anti-adhesion type process cavity of a TRACK machine glue evening unit. The anti-splash and anti-adhesion type process cavity comprises an upper process cavity, a middle process cavity and a lower process cavity, wherein the upper process cavity and the middle process cavity respectively cooperate with the lower process cavity to form one integral body, the inner-side surface of the upper process cavity is provided with an anti-splash groove and a coating hydrophilic layer, the anti-splash groove comprises an upper-portion anti-splash groove and a lower-portion anti-splash groove which are successively recessed upwards along the inner surface of the upper process cavity from top to bottom, and a wafer is disposed between the lowest edge of the upper-portion anti-splash groove and the lowest edge of the lower-portion anti-splash groove. According to the invention, splashes generated when a photoresist bumps into a CUP can be effectively prevented, through changing the hydrophilic and hydrophobic characteristic of the inner wall of the CUP, the adhesion of the photoresist on the inner wall of the CUP is reduced, and the performance of the glue evening unit can be effectively improved.

This invention provides an apparatus to prevent the liquid splash back to the object and especially relates to the apparatus used in the image-forming process. It at least comprises: a spinner with the object located on and to separate the object and liquid by use of the spinner; a side wall around the spinner to prevent the water splash out the side wall; and a buffer cotton attached into the inside of the side wall to prevent the water plash to the object through side wall.

The invention discloses a squatting, standing and sitting three-purpose pan. The squatting, standing and sitting three-purpose pan mainly comprises a squatting pan, a urinal and two sitting plates, wherein the squatting pan is integrally formed; the two sitting plates are arranged at human body sitting places on the two sides of the urinal and can be optionally unfolded outwards and retracted inwards; the squatting pan is the pedestal of the urinal; an interlayer type urine hopper with an opened upper end and an opened lower end which prevents the urine from splashing outwards is arranged on the lower part of the urinal; the sitting plates can be connected with the urinal by vertical rotating shafts; when being inwards folded, the two sitting plates can serve as the squatting pan, and when being respectively unfolded outwards, the two sitting plates can serve as the urinal and the squatting pan, so that the squatting standing and sitting three-purpose pan is convenient to clean; supporting legs for supporting the sitting plates, a baffle plate for preventing feces, urine and flushing water from splashing outwards and a baffle plate flow-guiding pipe provided with a row of flushing holes and closed or connected with outward unfolding or folding of the sitting plates are attached to the downside of each sitting plate. The squatting standing and sitting three-purpose pan has the beneficial effects of preventing the ground from being wetted by water dripping, preventing buttocks from being wetted by water splashing, preventing the body, the clothes and trousers of a user from contacting the public pan sitting plate when the user squats, so that venereal disease transmission is controlled, cleaning human power and water consumption are reduced, and the mounting rate and the utilization rate of the pan in a public toilet in unit area are improved.

A vertical Marangoni wafer processing device, comprising: a drive mechanism for driving the wafer to rotate vertically, a supply arm for transporting fluid, and a box body, the supply arm can swing vertically and is arranged on A nozzle assembly at its free end supplies fluid onto the wafer; it is characterized in that the nozzle assembly includes a first nozzle arm and a second nozzle arm with nozzles, the first nozzle arm and the second nozzle arm along the The supply arm is extended and rotatably fixedly arranged at the free end of the supply arm.

A Marangoni drying device with adjustable spray angle, comprising: a driving mechanism for vertically rotating wafers, a supply arm for transporting fluid, and a box; the supply arm can swing vertically and is arranged on A nozzle assembly at its free end supplies fluid onto the wafer; the nozzle assembly includes a first nozzle arm having nozzles and a second nozzle arm extending along the supply arm , rotatably fixedly disposed at the free end of the supply arm; the first nozzle arm is located below the second nozzle arm, the first nozzle arm has one nozzle and the second nozzle arm has two nozzles; and the The nozzles of the first nozzle arm are perpendicular to the axis of the first nozzle arm, and the nozzles of the second nozzle arm are arranged obliquely on the second nozzle arm with a hook back or a nose.

The present invention belongs to the field of semiconductor industry wafer wet processing, and specially relates to a device for preventing backwash liquid from polluting a wafer. A lifting CUP, a swing arm, a nozzle and a wafer carrying table are located in a process cavity, a power source is installed below the process cavity, an output end of the power source is connected with the lifting CUP,the wafer carrying table is located at the internal portion of the lifting CUP, and the nozzle is installed on the swing arm to swing with the swing arm; a gas protection ring is installed at the topportion of the lifting CUP, a plurality of gas outlets are uniformly distributed at the circumference of the inner side of the gas protection ring, at least one gas inlet is arranged at the circumference of the outer side of the gas protection ring, the at least one gas inlet and the gas outlets are communicated through internal gas rings arranged in the gas protection ring, the at least one gas inlet communicates with a gas supply source, gas is ejected through the internal gas rings and the gas outlets, a gas protection layer is formed at the inner side of the gas protection ring, and backwash liquid is renewedly flown into the lifting CUP. The device for preventing backwash liquid from polluting a wafer can prevent the liquid from being subjected to backwash at the surface of the swingarm to form liquid drops, can avoid that the liquid drops drop to the surface of the wafer in subsequent process steps so that the wafer is prevented from being polluted.

The invention discloses a multifunctional bed-pan for elderly care. The multifunctional bed-pan includes a bed-pan body, the bottom of one side of the bed-pan body is communicated with an excrement guide device, the bottom of the excrement guide device is spirally connected with an excrement guide pipe through a first internal spiral pipe, the position of the bottom end of the other side of the bed-pan body is communicated with a urine guide device, the bottom of the urine guide device is spirally connected with a catheter through a second internal spiral pipe, and the excrement guide pipe andthe other end of the catheter are communicated with a connector. In the multifunctional bed-pan for elderly care, the bed-pan body is communicated with the connector through the excrement guide device and the excrement guide pipe, and the bed-pan body is communicated with the connector through the urine guide device and the catheter; at the same time, the connector is communicated with an excrement storage bag through an external spiral pipe, so that excrement and urine are guided into the same excrement storage bag, and disposal cleaning is facilitated; the excrement guide device and the catheter are each of a detachable structure and can be dismantled randomly from a part, thereby facilitating cleaning.

The invention provides a Marangoni drying device with an adjustable injection angle. The device comprises a driving mechanism for vertically rotating a wafer, a supply arm for conveying a fluid, and abox body, wherein the supply arm is vertically swingable and supplies the fluid onto the wafer through a nozzle assembly provided at a free end thereof; the nozzle assembly comprises a first nozzle arm with a nozzle and a second nozzle arm with nozzles, wherein the first nozzle arm and the second nozzle arm extend along the supply arm and are rotatably fixed at the free end of the supply arm, thefirst nozzle arm is positioned below the second nozzle arm, the first nozzle arm is provided with the one nozzle, the second nozzle arm is provided with the two nozzles, the nozzle of the first nozzle arm is perpendicular to the axis of the first nozzle arm, and the nozzles of the second nozzle arm are obliquely arranged on the second nozzle arm in a backwards-hooked or forwards-stretched mode.

The invention discloses a closestool capable of preventing sewage back-splashing and sanitary in use and a using method thereof. The closestool comprises a water tank and a closestool body, the closestool body comprises a closestool wall, a sewage discharging passage, a dirt falling plate, a water draining passage and a water-permeable component, an arc-shaped concave slope is arranged on the inner side, away from the water tank, of the closestool wall, and the lower end of the arc-shaped concave slope is tangent with a pipe wall of the sewage discharging passage; the dirt falling plate is arranged at a position, close to the water tank, in the closestool wall, and the lower end of the dirt falling plate contacts with stored water in the sewage discharging passage; the water draining passage is arranged on the upper portion of the closestool wall, water draining holes I and water draining holes II are formed in the water draining passage, and hole diameter of the water draining holes I is smaller than that of the water draining holes; the water draining holes I encircle the dirt falling plate, the water draining holes II encircle the sewage discharging passage, and the water-permeable component is mounted on the closestool body and communicates the water draining passage with the water tank. A dirt falling area is limited through the dirt falling plate, so that dirt is avoided directly contacting with water in the sewage discharging passage, and back-splashing of sewage is prevented.

The present invention relates to a restrictive scanning gas-atomizing system. It is formed from gas-atomizing nozzle, guide mechanism and scanning-swinging mechanism. Said guide mechanism is positioned in the centre of gas-atomizing nozzle, said gas-atomizing nozzle is connected with scanning-swinging mechanism by means of connecting component, and the axis of the described guide mechanism is coincided with the axis of said gas-atomizing nozzle. Said invention can improve atomizing effect, and can raise the quality of spray-formed blank, and can be used for spray-forming wide-width plate blank, pipe blank and rod blank.

A four-stroke reciprocating piston internal combustion engine with an intake valve an exhaust valve and a valve drive assembly driven by the crankshaft for actuating the intake valve and the exhaust valve. A mixture-preparation device supplies an air / fuel-lubricant mixture to the crankcase, which together with the piston functions as a pump for the mixture charge. A valve drive assembly housing comprising one or more sections and the intake channel is supplied with a connecting duct communicating with the crankcase volume either by being connected to the crankcase or the cylinder, or by being connected to the valve drive assembly housing, which communicates with the crankcase volume, and the communication from the intake channel to the crankcase volume is arranged through at least one valve.

The invention discloses a grab arm device for automobile door spraying. The grab arm device for the automobile door spraying comprises a grab arm device main body and a connector arranged at the end of the grab arm device main body, wherein the outer side wall of the connector is fixedly sleeved with an installation block, the outer side wall of the installation block is connected with a cylindrical protective cover by a connecting mechanism, and the protective cover is located outside the connector. When the grab arm device provided by the invention is used, the splashed spraying material canbe absorbed effectively through the cooperation of the protective cover, a connecting block, a clamping block, a spring and a magnet strip as well as using the cooperation of the protective cover andabsorbing cotton; the spraying material is prevented from splashing back to the side wall of the grab arm device main body; the grab arm device main body is convenient to clean and grab; meanwhile, the situation that the rotation part of the grab arm device main body cannot rotate due to the splashed spraying material is avoided; and the spraying cost of an enterprise is effectively reduced.

The invention discloses a wafer cleaning device and a wafer cleaning method. The wafer cleaning device comprises a bearing table, at least one nozzle, a chassis, an upper shell and a lower shell. The bearing table is used for bearing a wafer, and the top surface of the wafer is coated with a photoresist. The at least one nozzle is used for spraying a cleaning solution towards the wafer. The chassis is used for recovering cleaning solution. And the lower shell is arranged on the chassis. The upper shell is arranged on the lower shell, the base plate, the lower shell and the upper shell surround and contain the bearing table, the upper shell and the lower shell jointly form a liquid flow channel extending towards the bearing table and the base plate, and the liquid flow channel is used for guiding the cleaning solution to flow to the base plate. Therefore, the wafer cleaning device can effectively spray the cleaning solution to the wafer and recover the cleaning solution.

The present invention provides a device for preventing a liquid from splashing back on an object, in particular to a device for preventing splashing back into a developing process, which at least includes: a rotator, on which the above-mentioned object is placed, and a rotating device is used for rotating The rotating motion of the rotator separates the object from the liquid; a side wall surrounds the rotator to prevent the liquid from splashing outside the side wall; and a buffer cotton is attached to the inner side of the side wall to prevent the liquid from Side wall splashes back onto the object.

The invention provides a cleaning medium collecting device and relates to the technical field of semiconductor wafer processes. The cleaning medium collecting device is used for collecting cleaning media after cleaning during the cleaning process of wafers borne on a rotary body and comprises a cleaning medium collecting structure, an annular cavity, a piezoelectric ceramic ultrasonic atomizing device, an exhaust component, a liquid discharge component and a condensation recovery device. The annular cavity is arranged at the peripheral edge of the rotary body. The high-frequency vibration performance of the piezoelectric ceramic ultrasonic atomizing device is utilized to atomize the liquid cleaning media tossed out during the cleaning process, liquid cleaning medium back splashing is prevented, secondary pollution is avoided, and wafer quality is further increased. Meanwhile, the atomized cleaning media are recycled through the exhaust component and the condensation recovery device, the cleaning media not atomized are recycled through the liquid discharge component, the recycling efficiency of the cleaning media is increased greatly, and cost is saved.

The invention discloses a lost foam casting machining method of a vehicle front slave plate base and belongs to the field of pouring machining. The method includes the following steps that firstly, molten steel is smelted, wherein the molten steel is prepared from, by mass, 0.25-0.3% of C, 0.2-0.5% of Si, 0.5-0.9% of Mn, 0.4-0.5% of Ni and 0.3-0.4% of Cu; secondly, a foam mold model and a pouringsystem are manufactured, and the foam mold model is subjected to vibration ramming in a sand box; thirdly, the smelted molten steel is poured, so that the foam mold model in the sand box disappears, and a casting is formed; fourthly, after being cooled, the casting is taken out, and following cleaning is carried out. The defects that in the prior art, the machining labor intensity of the vehicle front slave plate base is high, and the machining efficiency of the vehicle front slave plate base is low are overcome, the machining labor intensity can be effectively reduced, the machining efficiency is improved, structural distortion of the front slave plate base can be avoided, the machining precision is guaranteed, and the machining percent of pass of products is effectively improved.

The invention discloses a manufacturing process for a vehicle front draft lug, and belongs to the field of casting processing. The manufacturing process comprises the following steps: step I, smeltingmolten steel which comprises the following components in percentage by weight: 0.25-0.3% of C, 0.2-0.5% of Si, 0.5-0.9% of Mn, 0.4-0.5% of Ni and 0.3-0.4% of Cu; step II, manufacturing a foam mould sample and a casting system, and vibrating and compacting the foam mould sample and the casting system in a sand box, wherein the casting system comprises a straight pouring gate, a transverse pouringgate and a branch pouring gate, the branch pouring gate is connected with the foam mould sample, and a non-axisymmetric pouring cup is arranged on the top of the straight pouring gate; step III, casting the smelted molten steel for enabling the foam mould sample in the sand box to lose and to form a casting; and step IV, cooling the casting, and taking out the casting to clear. The manufacturingprocess overcomes the defects such as high labor intensity and low processing efficiency of the vehicle front draft lug in the prior art, effectively reduces processing labor intensity, improves processing efficiency, avoids structural deformation of the front drug lug, guarantees processing precision, and effectively increases the product processing qualification rate.

The invention belongs to the technical field of cold-rolled emulsion spot treatment, and in particular relates to a blowing-free emulsion residue removal method, which is applied to various cold-rolling mills. The blowing-free emulsion residue removal method is characterized by comprising the following steps of: 1) blocking low inertia force return of the emulsion; 2) blocking side fluid channeling of the emulsion; 3) blocking fluid channeling of intermediate roll shifting empty emulsion; 4) blocking the condensate of the emulsion; 5) rapidly draining the injection beam of the emulsion; and 6) preventing splashing. The blowing-free emulsion residue removal method has the advantages of simpleness and excellent treatment efficiency.