39results about How to "Fast ranging" patented technology

The invention discloses a method for locating a non-homonymic phase overline earth fault of a double-circuit line based on binary search. The method includes the steps that firstly, fault phase voltage, fault phase current and zero-sequence current of the protection installing position of a I-circuit line of the double-circuit line on the same pole are measured, lumped parameter modeling is adopted, zero-sequence current of an II-circuit line of the double-circuit line on the same pole is calculated, zero-sequence compensating current of the I-circuit line of the double-circuit line on the same pole is calculated, the non-homonymic phase overline earth fault of the double-circuit line is accurately located by the adoption of a binary search method and through the characteristic that a relative coefficient of the positions in front of and behind the non-homonymic phase overline earth fault point is abruptly changed into a value smaller than 0 from a value larger than 0, the influences of interline zero-sequence mutual inductance, transition resistance and load current on fault locating accuracy are eliminated, high capacity for resisting the influences of the transition resistance and the load current is achieved, and no fault location dead zones exist when the non-homonymic phase overline earth fault of the double-circuit line is generated at a protection positive direction outlet.

The invention relates to the technical field of image ranging, in particular to a ranging method, device and electronic equipment. By obtaining the image of the ranging target captured by the ranging camera device and the horizontal distance from the ranging target to the center of the image, the horizontal size of the image and the viewing angle of the ranging camera device are obtained, according to the viewing angle, horizontal distance and horizontal size Obtain the ranging angle; obtain the vertical distance from the ranging target to the center of the image and the pixel height of the vertical distance in the photosensitive element, obtain the vertical size of the photosensitive element in the vertical direction and the vertical pixel size corresponding to the vertical size, and obtain the vertical distance from the photosensitive element to the camera For the photosensitive distance of the lens, calculate the product of the vertical pixel size, photosensitive distance and vertical distance, and divide the product by the cosine value of the pixel height, vertical size and distance measurement angle to obtain the distance from the distance measurement camera device to the distance measurement target. This method can measure distance quickly.

The invention provides a distance measurement model construction method, a distance measurement method, a device and an automatic driving system, which are applied to a binocular camera with a symmetrically inclined optical axis. The construction method includes: based on the baseline distance B of the binocular camera, the measured Distance Z, the distance Z from the intersection of the optical axes of the binocular camera to the X axis 0 And the tangent function to get the tangent function formula of α and β. Wherein, α is the angle formed by the left or right camera of the binocular camera and the Y axis, and β is the line connecting the measured point W to the optical center of the left camera or the optical center of the right camera of the binocular camera and the Y axis The included angle; according to the actual relationship between the intersection point of the optical axis of the binocular camera and the measured point, the tangent function formula of α and β deduces the ranging model of the binocular camera whose optical axis is symmetrically inclined. The present invention constructs the ranging model of the binocular camera whose optical axis is inclined symmetrically, and obtains various parameters in the ranging model when the binocular camera is calibrated, so that the binocular camera can quickly and accurately measure the distance in the subsequent use process .