The invention discloses magnetron
sputtering coating equipment integrated with a measuring device and an application method of the magnetron
sputtering coating equipment, and particularly relates to the technical field of thin film deposition. The magnetron
sputtering coating equipment comprises a process main chamber, a sample introduction chamber, a vacuum transmission cavity, a front supporting frame, a rear supporting frame, a
wafer conveying device, a stress
measuring instrument, a film thickness
measuring instrument and a
control system; the process main chamber and the sample introduction chamber are fixedly mounted at the top of the front support frame, the process main chamber and the vacuum transmission chamber are fixedly mounted on two sides of the sample introduction chamber respectively, the stress
measuring instrument, the film thickness measuring instrument and the
control system are fixedly mounted on the inner wall of the rear support frame, and the
wafer conveying device is fixedly mounted in the rear support frame. According to the equipment disclosed by the invention, multi-target co-sputtering film formation and
ion source auxiliary sputtering film formation of wafers of 8 inches and below can be realized; the
automatic transmission of the
wafer can be realized, the coating equipment and the measuring device are controlled through a preset
system, and the
stress measurement before and after film formation, the film thickness measurement and the calculation of the film stress are realized.