The invention provides a new repairing
line structure, which comprises the original repairing lines, intermittent repairing lines and auxiliary repairing lines; the repairing lines are not directly overlapped with
signal scan lines. The intermittent repairing lines are partially overlapped with two
signal scan lines, or more than two
signal scan lines are outspread as a unit. The intermittent repairing lines and the signal scan lines are overlapped into two or more rows. The manufacturing method of the repairing
line structure is as follows: a
metal film is arranged on a substrate through
sputtering; a
mask template forms intermittent repairing lines and auxiliary repairing lines outside a pixel area of the substrate through the
exposure process and the chemical
etching process; an
electrode insulating layer film is arranged on the substrate; a
metal film is deposited on the substrate; the
mask template forms array substrate signal scanning electrodes through the
exposure process and the chemical
etching process, and forms the repairing lines outside the pixel area of the substrate at the same time. The repairing points are completely positioned in
liquid crystal so as to avoid bad connections caused by oxidation
corrosion; in addition, various repairing routes are provided to avoid incapable repairing due to the breaking of certain repairing line. The repairing points are completely positioned in
liquid crystal so as to avoid bad connections caused by oxidation
corrosion; in addition, various repairing routes are provided to avoid incapable repairing caused by the breaking of certain repairing line.