The present invention relates to a
sputtering target of a multi-component single body, a preparation method thereof, and a method for fabricating a multi-component
alloy-based nanostructured thin film using the same. The
sputtering target according to the present invention comprises an amorphous or partially crystallized glass-forming
alloy system composed of a
nitride forming
metal element, which is capable of reacting with
nitrogen to form a
nitride, and a non-
nitride forming element which has no or low
solid solubility in the nitride forming
metal element and does not react with
nitrogen or has low reactivity with
nitrogen, wherein the nitrogen forming
metal element comprises at least one element selected from Ti, Zr, Hf, V, Nb, Ta, Cr, Y, Mo, W, Al, and Si, and the non-nitride forming element comprises at least one element selected from Mg, Ca, Sc, Ni, Cu, Ag, In, Sn, La, Au, and Pb.