Patents
Literature
Patsnap Copilot is an intelligent assistant for R&D personnel, combined with Patent DNA, to facilitate innovative research.
Patsnap Copilot

118results about How to "Taking image" patented technology

Imaging for a machine-vision system

Manufacturing lines include inspection systems for monitoring the quality of parts produced. Manufacturing lines for making semiconductor devices generally inspect each fabricated part. The information obtained is used to fix manufacturing problems in the semiconductor fab plant. A machine-vision system for inspecting devices includes a light source for propagating light to the device and an image detector that receives light from the device. Also included is a light sensor assembly for receiving a portion of the light from the light source. The light sensor assembly produces an output signal responsive to the intensity of the light received at the light sensor assembly. A controller controls the amount of light received by the image detector to a desired intensity range in response to the output from the light sensor. The image detector may include an array of imaging pixels. The imaging system may also include a memory device which stores correction values for at least one of the pixels in the array of imaging pixels. To minimize or control thermal drift of signals output from an array of imaging pixels, the machine-vision system may also include a cooling element attached to the imaging device. The light source for propagating light to the device may be strobed. The image detector that receives light from the device remains in a fixed position with respect to the strobed light source. A translation element moves the strobed light source and image detector with respect to the device. The strobed light may be alternated between a first and second level.
Owner:ISMECA SEMICONDUCTOR HOLDING SA

Parts manipulation and inspection system and method

Manufacturing lines include inspection systems for monitoring the quality of parts produced. Manufacturing lines for making semiconductor devices generally inspect each fabricated part. The information obtained is used to fix manufacturing problems in the semiconductor fab plant. A machine-vision system for inspecting devices includes a light source for propagating light to the device and an image detector that receives light from the device. Also included is a light sensor assembly for receiving a portion of the light from the light source. The light sensor assembly produces an output signal responsive to the intensity of the light received at the light sensor assembly. A controller controls the amount of light received by the image detector to a desired intensity range in response to the output from the light sensor. The image detector may include an array of imaging pixels. The imaging system may also include a memory device which stores correction values for at least one of the pixels in the array of imaging pixels. To minimize or control thermal drift of signals output from an array of imaging pixels, the machine-vision system may also include a cooling element attached to the imaging device. The light source for propagating light to the device may be strobed. The image detector that receives light from the device remains in a fixed position with respect to the strobed light source. A translation element moves the strobed light source and image detector with respect to the device. The strobed light may be alternated between a fit and second level.
Owner:LEMAIRE CHARLES A

Method and apparatus for enhanced spatial bandwidth wavefronts reconstructed from digital interferograms or holograms

The present invention discloses a method and an apparatus to compute a complex wavefield, referred to as the object wave o, by means of measuring the intensity signal resulting from the interference of the said object wave with a second wave termed the reference wave. The second wave r is assumed to have some non-vanishing mutual coherence with the said object wave o. The reference wave can be obtained from a source or from the object wave itself. The wave may be emitted from sources of variable degree of coherence and can be scattered waves, but also light-emitting molecules, matter waves such as electron beams or acoustical sources. The disclosed method relates to the said “non-linear method” (NLM). The innovation resides in the fact that the NLM improves considerably the bandwidth of the wavefront reconstructed from off-axis interferograms and holograms obtained in a single shot. The advantage is the significant improvement of the resolution of the images obtained from the reconstructed wavefront, i.e. amplitude and phase images. The said method also suppresses the artifacts resulting from the intensity recording of interferograms and holograms. The method is general in the sense that it can be used for any interferometric measurement, provided that it satisfies the simple requirement that the intensity of the reference wave is larger than the intensity of the object wave, and that the object wave modulated by the reference is confined to at least a quadrant of the spectrum. The disclosed method applies to interferometry, holography in optics, electron waves and acoustics. In particular, it can be implemented in phase, fluorescence, luminescence, electron and acoustic microscopy.
Owner:ECOLE POLYTECHNIQUE FEDERALE DE LAUSANNE (EPFL)
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products