2 results about "Allyl halides" patented technology

This invention relates to the field of polymer materials technology, and discloses a photocurable modified fluorocarbon resin, its preparation method, and its application. The method includes: (1) mixing a hydroxyl-containing fluorocarbon resin with an organic solvent to obtain a resin solution with a concentration of 30-50 wt%; (2) contacting the resin solution with an allyl halide and an acid-binding agent, and carrying out a first reaction under inert gas protection to obtain mixture I; (3) sequentially filtering mixture I to remove inorganic salts, washing to neutrality, dehydrating, and concentrating to obtain a photocurable modified fluorocarbon resin. The photocurable modified fluorocarbon resin provided by this invention is suitable for dual protection processes of UTG acid etching and alkali etching, achieving residue-free peeling, and exhibiting a low Ra value for the UTG surface roughness after peeling. It has advantages such as strong etching resistance, fast curing speed, simple process, and low cost, making it suitable for large-scale production of foldable screen UTG.

This invention relates to the field of organic synthesis, specifically to a method for the in-situ reaction of an α-diazoketone with a Wolff rearrangement to generate an enone, sodium pentafluorophenolate, and an allyl halide, yielding a pentafluorophenol ester, a tertiary carboxylic acid containing a quaternary carbon center. In this invention, under a nitrogen atmosphere, α-diazoketone, tetrakis(triphenylphosphine)palladium, sodium pentafluorophenolate, and an allyl halide are sequentially added to a reaction solvent. The mixture is stirred at 25°C under 15W blue LED illumination until the reaction is complete. After filtration and purification, the pentafluorophenol ester product containing a quaternary carbon center is obtained. The preparation method of this invention is simple to operate (the reactive enone participates in the reaction in situ via the Wolff rearrangement), has high atom economy, mild conditions, and good substrate universality.