The invention discloses a uniform projection type
electron optical structure, which comprises a
cathode region, a beam-forming region, and an
electron gun outlet region; a
cathode is arranged in the
cathode region, the cathode projects electrons, and a cathode emission surface is formed; from the cathode emission surface, the electrons pass through the beam-forming region and the
electron gun outlet region to emit, ultimately forming a projection region; the beam-forming region comprises at least two subbeam-forming regions, each subbeam-forming region is of a
metal barrel structure, and moreover, the potentials of all the
metal barrels can be separately regulated to control the forms of electron beams in the regions; the beam-forming region generates a primary upside-down
real image for the cathode emission surface; the projection region is a secondary upside-down
real image of the cathode emission surface, and ultimately, the electrons are uniformly projected. Compared with the priorart, a
metal grid does not need to be arranged, a high-
voltage electric field is used for being focused to project the secondary upside-down
real image of the cathode to a required region, and the uniformity of the electron beam of the projection region is ensured by the optimized structure.