Provided is a method for manufacturing a
semiconductor device. Also provided are: a
semiconductor device which can be obtained by the method; and a dispersion that can be used in the method. A method for manufacturing a
semiconductor device (500a) of the present invention comprises the steps (a)-(c) described below and is characterized in that the
crystal orientation of a first
dopant implanted layer (52) is the same as the
crystal orientation of a semiconductor layer or a base (10) that is formed of a semiconductor element. (a) A dispersion which contains doped particles is applied to a specific part of a layer or a base. (b) An unsintered
dopant implanted layer is obtained by
drying the applied dispersion. (c) The specific part of the layer or the base is doped with a p-type or n-type
dopant by irradiating the unsintered dopant implanted layer with light, and the unsintered dopant implanted layer is sintered, thereby obtaining a dopant implanted layer that is integrated with the layer or the base.